Patents Assigned to Basys Print Systeme fuer die Druckindustrie
  • Exposure device
    Patent number: 6567205
    Abstract: An exposure device with a lamp, a condenser arrangement (2), a light modulator, a field lens and a projection objective (5), characterised in that the light modulator consists of a reflecting micro-mirror arrangement (3) in front of which the field lens (4) is arranged in a manner such that the beam path runs through the field lens (4) onto the micro-mirror arrangement (3) and after modulation and reflection at acute angles (16) once again runs through the field lens (4).
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: May 20, 2003
    Assignees: Basys Print Systeme fuer die Druckindustrie, Tokyo Ink Mfg. Co., Ltd.
    Inventors: Stefan Eggers, Hans-Dieter Straeter