Abstract: A Soller slit device is provided for collimation of high energy radiation, such as X-ray or EUV radiation, and has a low angle of divergence (less than 0.1°) and a high transmission efficiency (60 to 80% or greater). The Soller slit is made up of multiple, parallel blades of low-density material, such as glass, mica, or the like, which can be treated to reduce reflectivity. The Soller slit device of the invention advantageously provides an increased peak intensity and decreased peak width in diffraction patterns produced in high energy diffractometry applications, such as X-ray diffractometry.

Abstract: The invention provides a miniaturized multi-foil object for use in a laboratory environment and other practical applications that require small or portable and/or disposable high energy radiation optics. Specifically, the invention finds utility in high energy lithographic systems, such as X-ray or EUV lithography, as a condenser optic or in topographic systems. In lithographic systems, the present invention exhibits square symmetry, a relatively large aperture size, and disposability. Additionally, the multi-foil optic of the invention provides a high throughput efficiency.

Abstract: A Soller slit device is provided for collimation of high energy radiation, such as X-ray or EUV radiation, and has a low angle of divergence (less than 0.1°) and a high transmission efficiency (60 to 80% or greater). The Soller slit is made up of multiple, parallel blades of low-density material, such as glass, mica, or the like, which can be treated to reduce reflectivity. The Soller slit device of the invention advantageously provides an increased peak intensity and decreased peak width in diffraction patterns produced in high energy diffractometry applications, such as X-ray diffractometry.

Abstract: The invention provides a miniaturized multi-foil object for use in a laboratory environment and other practical applications that require small or portable and/or disposable high energy radiation optics. Specifically, the invention finds utility in high energy lithographic systems, such as X-ray or EUV lithography, as a condenser optic or in topographic systems. In lithographic systems, the present invention exhibits square symmetry, a relatively large aperture size, and disposability. Additionally, the multi-foil optic of the invention provides a high throughput efficiency.