Abstract: A shift register unit and a driving method thereof, a gate driving circuit and a driving method thereof, and a display device are provided to improve a stability of the shift register unit. The shift register unit includes a first input circuit, a second input circuit, an output circuit, a first pull-down circuit, and a second pull-down circuit and further includes: a first pull-down control circuit configured to control a level of the first pull-down node; a second pull-down control circuit configured to output a voltage of the third voltage terminal to the first pull-down node under the control of the fifth voltage terminal; a third pull-down control circuit configured to control a level of the second pull-down node; and a fourth pull-down control circuit configured to output the voltage of the third voltage terminal to the second pull-down node under the control of the fourth voltage terminal.

Abstract: The present disclosure relates to a virtual reality display device and an adaptive parallax adjustment method for the virtual reality display device, which belong to the display technical field. The adaptive parallax adjustment method includes: obtaining pupil distance information of a user; and adjusting a position of a to-be-displayed image on a display screen according to the pupil distance information.

Abstract: The present disclosure provides an array substrate. The array substrate includes a bottom substrate; a plurality of gate lines and a plurality of data lines arranged on the bottom substrate for defining a plurality of subpixel regions; and a plurality of common electrode pads, each common electrode pad being located in a corresponding subpixel region, wherein one or more of the common electrode pads form a self-capacitance electrode.

Abstract: The present invention provides a substrate fitting process and a substrate assembly to be fitted, wherein the substrate assembly to be fitted of the present invention, a periphery mold frame is disposed on a surface of a substrate, a cell mold frame is disposed inside said periphery mold frame, the height of said cell mold frame is larger than the height of said periphery mold frame. A substrate fitting process of the present invention comprises: providing a cell mold frame on a surface of a first substrate, providing a cell mold frame inside the periphery mold frame for sealing liquid crystal, the height of said cell mold frame is larger than the height of the periphery mold frame; extracting the air between the first substrate and the second substrate; making the first substrate fit with the second substrate preliminarily; filling the air between the first substrate and the second substrate; making the first substrate further fit with the second substrate.