Abstract: An ultrasonic/megasonic cleaning device includes a cleaning unit including an upper casing and a lower casing connected to form a hollow chamber, an ultrasonic/megasonic generator provided in the hollow chamber, and a bottom quartz component provided with a quartz rod array composed of a plurality of vertically arranged quartz rod-like structures; a spray arm connected to the upper casing; and an ultrasonic/megasonic frequency control unit connected between the at least one signal source and the ultrasonic/megasonic generator, for constantly varying a frequency of the electrical signal output from the at least one signal source and introducing the electrical signal into the ultrasonic/megasonic generator, so as to dynamically vary an oscillation frequency of the ultrasonic/megasonic wave generated by the ultrasonic/megasonic generator; wherein the ultrasonic/megasonic frequency control unit includes a frequency-switching timing control unit configured to trigger am ultrasonic/megasonic frequency switching con

Abstract: The present invention relates to the field of semiconductor manufacturing technology, more particularly to a swing spray device of a cleaning apparatus and a cleaning method. The swing spray device comprises a spray arm, a spray head and a driving unit. The spray head is connected with the spray arm, and is controlled to swim by the driving unit. The spray head is hinged with the spray arm to form a first hinge joint. The driving unit is an air cylinder; the piston rod of the air cylinder is connected with the spray head. The piston rod is hinged with the spray head to form a second hinge joint. Therefore, the better cleaning effects can be achieved both in the center and the edge of the wafer.

Abstract: The present invention provides a gas-liquid two-phase atomizing cleaning device. The cleaning device comprises a gas-liquid two-phase atomizing spray head. The spray head is a double jacket structure and comprises a nozzle, a rotating arm, a gas guide tube and a liquid guide tube; wherein the nozzle is connected with the rotating arm, the gas guide tube and the liquid guide tube are fixed to the rotating arm, the gas guide tube and the liquid guide tube are both provided with pneumatic valves.

Abstract: A loading and unloading device and method for a quartz reaction tube of a semiconductor diffusion equipment are provided; the loading and unloading device is used in combination with a lifting device of the quartz reaction tube; the lifting device has an interface flange that can be connected to the reaction tube. The loading and unloading device includes a translation drive structure, a linear guide rail, a bracket, and an auxiliary support structure to detachably fix the quartz reaction tube. During the loading procedure, the auxiliary support structure is mounted on the bracket; the front end of the translation drive structure is docked with the doorframes of the semiconductor diffusion equipment through a fixing structure, and the quartz reaction tube is docked with the interface flange of the lifting device by horizontally moving the bracket along the linear guide rail.

Abstract: The present invention provides a liquid replenishing device comprising a liquid storage tank, a chemical liquid supply pipeline, an ultrapure water supply pipeline, an ultrapure water quantitative supplement pipeline and a circulating pipeline. The chemical liquid supply pipeline supplies chemical liquids to the liquid storage tank. The ultrapure water supply pipeline supplies ultrapure water to the liquid storage tank. The ultrapure water quantitative supplement pipeline quantitatively replenishes ultrapure water to the liquid storage tank. One end of the circulating pipeline is connected with the outlet of the liquid storage tank, the other end of the circulating pipeline is connected with the inlet of the liquid storage tank.

Abstract: The present invention provides a cleaning device resistant to liquid backsplash comprises an upper casing and a lower casing. The upper casing moves upward and downward relative to the lower casing. The upper casing comprises an inner wall, an outer wall, and a hollow cavity formed therebetween. The inner wall is provided with a plurality of liquid inlet apertures which are communicated with the hollow cavity. Through the liquid inlet apertures and the hollow cavity provided in the cleaning device and the cleaning system of the present invention, the chemical liquids and/or particles used are introduced into the hollow cavity via the liquid inlet apertures and discharged via the liquid discharging apertures during the high speed rotation of the wafer so as to achieve better cleaning device.

Abstract: A device for holding disk-shaped articles and a method thereof are provided. The device comprises a rotatable chuck body and at least two groups of clamping elements arranged at the edge of the chuck body. Each of the clamping elements is mounted to a pivot with the chuck body respectively by means of the rotation of the clamping element with respect to the chuck body. A radial compression spring is connected between the bottom of the clamping element and the chuck body to provide a clamping force for the clamping element. The clamping elements in the same group are provided with magnets with the same polarity, while the clamping elements in different groups are provided with magnets with the opposite polarity. Two sets of electromagnets are arranged on the chuck body and spaced apart evenly.

Abstract: A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes dispensing liquid waters at two flow rates to stop a chemical reaction, with the second flow rate being lower than the first.

Abstract: A liquid dispenser for a wafer processing system includes a supply tube with an inlet at one end and an outlet at the other end. Attached to the supply tube at the outlet end is a liquid reservoir. The liquid reservoir has a dispensing plate that has an outlet for dispensing liquid onto a wafer. There is also a dispensing valve for controlling the dispensing of the liquid.

Abstract: The present invention provides an apparatus for manufacturing semiconductor wafer comprising at least two manipulators, at least one set of chemical gas/liquid distribution unit and an air circulating and filtering unit. The air circulating and filtering unit is separated into three regions, including the front region, the middle region, and the side region, which are controlled by respective control electric motors to achieve uniform air flow and uniform pressure in the respective regions. The cleaning degree in the internal of the apparatus can be improved by the regional control of the air circulating and filtering unit; the wafer transport efficiency can be enhanced by the double-armed manipulators having multiple degrees of freedom; and the product yield per unit area can be increased by the chemical gas/liquid distribution unit providing stable and uniform gas/liquid flow and pressure.

Abstract: The present invention provides a liquid storage device relates to the field of semiconductor manufacturing technology comprising: a liquid storage tank, a liquid intake tube, a liquid discharge tube and a gas discharge tube; the liquid intake tube, the liquid discharge tube and the gas discharge tube are all connected with the liquid storage tank; the liquid storage device also comprises a gas compensating tube connected with the liquid storage tank; the gas compensating tube comprises a differential pressure mechanism and a gas storage tank; one end of the differential pressure mechanism is connected with the liquid storage tank, and the other end is connected with the gas storage tank; the differential pressure mechanism is used for controlling the connection or disconnection between the liquid storage tank and the gas storage tank according to the pressure difference therebetween.

Abstract: An embodiment of the present invention is a technique to automate transfer of parts for high throughput. A boat transfer unit (BTU) arm carrying a boat containing a plurality of parts is rotated from an initial position to a first position that is below a process chamber. The BTU arm engages a boat support that supports the boat. The BTU arm is moved upward to a second position such that the boat partially enters the process chamber at a distance D with respect to an entrance opening of the process chamber. An elevator arm carrying a pedestal is engaged to lower side of the boat support. The BTU arm is moved away from the second position. The elevator arm is moved upward to fully insert the boat inside the process chamber.

Abstract: A flow meter is disclosed, which composes an operational amplifier, a digital potentiometer, a sensor coil, and fixed resistors R1, R2 and R3. One end of the coil is connected to the non-inverting input terminal of the amplifier, the other end is grounded. The R1 is connected between the non-inverting input terminal and the output terminal of the amplifier, the inverting input terminal of the amplifier is connected to one end of R2 and R3, the other end of R2 is connected to the output terminal of the amplifier, and the other end of R3 is grounded. The connecting end of R2 and the output terminal of the amplifier is connected to the high side of the potentiometer, the grounded end of R3 is connected to the low side of the potentiometer, and the inverting input terminal of the amplifier is also connected to the sliding end of the potentiometer.

Abstract: The present invention discloses a device for holding disk-shaped articles and a method thereof. The device comprises a rotatable chuck body and at least two groups of clamping elements arranged at the edge of the chuck body. Each of the clamping elements is mounted to a pivot with the chuck body respectively by means of the rotation of the clamping element with respect to the chuck body. A radial compression spring is connected between the bottom of the clamping element and the chuck body to provide a clamping force for the clamping element. The clamping elements in the same group are provided with magnets with the same polarity, while the clamping elements in different groups are provided with magnets with the opposite polarity. Two sets of electromagnets are arranged on the chuck body and spaced apart evenly.

Abstract: The present invention provides a liquid storage device relates to the field of semiconductor manufacturing technology comprising: a liquid storage tank, a liquid intake tube, a liquid discharge tube and a gas discharge tube; the liquid intake tube, the liquid discharge tube and the gas discharge tube are all connected with the liquid storage tank; the liquid storage device also comprises a gas compensating tube connected with the liquid storage tank; the gas compensating tube comprises a differential pressure mechanism and a gas storage tank; one end of the differential pressure mechanism is connected with the liquid storage tank, and the other end is connected with the gas storage tank; the differential pressure mechanism is used for controlling the connection or disconnection between the liquid storage tank and the gas storage tank according to the pressure difference therebetween.

Abstract: The present invention provides an apparatus for manufacturing semiconductor wafer comprising at least two manipulators, at least one set of chemical gas/liquid distribution unit and an air circulating and filtering unit. The air circulating and filtering unit is separated into three regions, including the front region, the middle region, and the side region, which are controlled by respective control electric motors to achieve uniform air flow and uniform pressure in the respective regions. The cleaning degree in the internal of the apparatus can be improved by the regional control of the air circulating and filtering unit; the wafer transport efficiency can be enhanced by the double-armed manipulators having multiple degrees of freedom; and the product yield per unit area can be increased by the chemical gas/liquid distribution unit providing stable and uniform gas/liquid flow and pressure.

Abstract: A flow meter is disclosed, which composes an operational amplifier, a digital potentiometer, a sensor coil, and fixed resistors R1, R2 and R3. One end of the coil is connected to the non-inverting input terminal of the amplifier, the other end is grounded. The R1 is connected between the non-inverting input terminal and the output terminal of the amplifier, the inverting input terminal of the amplifier is connected to one end of R2 and R3, the other end of R2 is connected to the output terminal of the amplifier, and the other end of R3 is grounded. The connecting end of R2 and the output terminal of the amplifier is connected to the high side of the potentiometer, the grounded end of R3 is connected to the low side of the potentiometer, and the inverting input terminal of the amplifier is also connected to the sliding end of the potentiometer.