Patents Assigned to BEIJING U-PRECISION TECH CO., LTD.
  • Patent number: 12645156
    Abstract: Disclosed is a phase measurement device, comprising: a first wave plate, a first polarization splitting prism, a fourth wave plate, a retroreflector, a third wave plate, a reflector, a second wave plate, a polarizer, a second polarization splitting prism, a third polarization splitting prism, a first photoelectric detector, a second photoelectric detector, and a base, wherein the first to third polarization splitting prisms and the first and second photoelectric detectors are fixed on the base; the first to fourth wave plates are respectively arranged around the periphery of the first polarization splitting prism; the polarizer is arranged on an emitting surface of the third polarization splitting prism; the retroreflector is arranged on an outer side of the fourth wave plate; and the reflector is arranged on an outer side of the third wave plate. An interferometric signal is resolved to obtain a measurement light beam phase.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: June 2, 2026
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Yu Zhu, Leijie Wang, Ming Zhang, Jitao Xu, Rong Cheng, Jiankun Hao, Xin Li, Kaiming Yang, Yujiao Fan, Siqi Gao
  • Patent number: 12460917
    Abstract: Interferometer displacement measurement system and method are disclosed, wherein, a measurement light is processed by a first polarization splitting prism, a first ¼ wave plate, a first splitting prism, an optical waveguide component and a reflector, and then is returned to a first photoeletric detector and a second photoeletric detector. The reference light is processed by a second polarization splitting prism, a second ¼ wave plate, a second splitting prism and a reflecting mirror, and then is returned to the first photoeletric detector and the second photoeletric detector. The first photoeletric detector forms a measurement signal according to the processed measurement light and the processed reference light, and the second photoeletric detector forms a reference signal according to the processed measurement light and the processed reference light. Displacement information of the object to be detected is determined according to the measurement signal and the reference signal.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: November 4, 2025
    Assignees: BEIJING U-PRECISION TECH CO., LTD., Beijing United Victory Precision Technology Co., Ltd.
    Inventors: Guohua Sun, Xiaoliang Gao, Lei Xu
  • Patent number: 12393127
    Abstract: An exposure light beam phase measurement method for laser interference photolithography comprises: separating a measurement light from an exposure light beam and inputting light into a laser phase measurement interferometer to carry out phase measurement on the exposure light beam; inputting a reference light beam homologous with the exposure light beam into the laser phase measurement interferometer; processing the reference light beam to form an interference measurement optical signal; calculating to obtain the phase of the exposure light beam. A laser interference photolithography system using the method comprises a laser phase measurement interferometer, a controller and phase modulators, the laser phase measurement interferometer measures whether the phase of an exposure light beam drifts, the controller controls phase modulators to carry out phase modulation, to achieve locking of exposure stripe phase drift and manufacturing of a high-precision variable-period optical grating.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: August 19, 2025
    Assignees: Tsinghua University, Beijing U-Precision Tech Co., Ltd.
    Inventors: Leijie Wang, Yu Zhu, Ming Zhang, Jitao Xu, Rong Cheng, Xin Li, Kaiming Yang, Jinchun Hu
  • Patent number: 12346030
    Abstract: A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.
    Type: Grant
    Filed: July 1, 2021
    Date of Patent: July 1, 2025
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Leijie Wang, Yu Zhu, Ming Zhang, Rong Cheng, Yuezhu Yang, Xin Li, Kaiming Yang
  • Patent number: 12332053
    Abstract: Disclosed is a heterodyne grating interferometry system based on secondary diffraction, including a single-frequency laser, an input optical fiber, an acousto-optic modulator, a reading head, and a measurement grating, an output optical fiber, a photoelectric conversion unit and an electronic signal processing unit, wherein the single-frequency laser emits a single-frequency laser, which enters the acousto-optic modulator through the input optical fiber, and is divided into a reference light and measurement light to be input to the reading head, wherein the reading head and the measurement grating convert the reference light and measurement light into a reference interference optical signal and a measurement interference optical signal and send them to the photoelectric conversion unit through the output optical fiber and wherein the photoelectric conversion unit converts the measurement interference optical signal and the reference interference optical signal into a measurement interference electrical signal
    Type: Grant
    Filed: September 14, 2021
    Date of Patent: June 17, 2025
    Assignees: Tsinghua University, Beijing U-Precision Tech Co., Ltd.
    Inventors: Yu Zhu, Leijie Wang, Ziwen Guo, Ming Zhang, Rong Cheng, Weinan Ye, Zhaokui Cheng
  • Patent number: 12332041
    Abstract: A heterodyne fiber interferometer displacement measuring system, including a laser light source assembly for simultaneously emitting measuring light and reference light; a first photoelectric detector, a first fiber coupler, a fiber ferrule, a plano-convex lens, a first polarizing beam splitting prism, and a first reflecting device which are sequentially provided on an optical path of the measuring light on the basis of first single mode fibers; and a second photoelectric detector, a second fiber coupler, a collimator, a second polarizing beam splitting prism, and a second reflecting device which are sequentially provided on an optical path of the reference light on the basis of second single mode fibers. An object to be measured is fixed on the first reflecting device, the reference light and the measuring light are processed to form measurement and reference signals, and displacement information of the object is determined according to the measurement reference signals.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: June 17, 2025
    Assignees: BEIJING U-PRECISION TECH CO., LTD., Beijing United Victory Precision Technology Co., Ltd.
    Inventors: Guohua Sun, Zhaokui Cheng, Shengli Guo
  • Patent number: 12038690
    Abstract: A laser interference photolithography system, comprising a laser device, a first reflector, a grating beam-splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitting prism, a control module, an angle measurement module, a third lens and a substrate. The control module comprises a signal processing terminal, a controller, and a driver. The signal processing terminal is connected to the angle measurement module, the controller is connected to both the signal processing terminal and the driver, and the driver is connected to both the first universal reflector and the second universal reflector. The laser emits a laser light that is split into two beams of light by the system, and the two beams of light are focused on the substrate for exposure.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: July 16, 2024
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Leijie Wang, Yu Zhu, Ming Zhang, Jitao Xu, Xin Li, Rong Cheng, Kaiming Yang, Jinchun Hu
  • Patent number: 11940349
    Abstract: Disclosed is a plane grating calibration system, comprising an optical subsystem, a frame, first vibration isolator, a vacuum chuck, a workpiece stage, second vibration isolator, a base platform and a controller; the optical subsystem is mounted on the frame, and the frame is isolated from vibration by the first vibration isolator; the vacuum chuck is rotatably mounted on the workpiece stage, the workpiece stage is positioned on the base platform, and the base platform is isolated from vibration by the second vibration isolator. A displacement interferometer is integrated into the optical subsystem, and the entire optical subsystem adopts a method of sharing a light source, thereby avoiding the problems of low wavelength precision and poor coherence of separate light sources.
    Type: Grant
    Filed: May 13, 2020
    Date of Patent: March 26, 2024
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Leijie Wang, Ming Zhang, Yu Zhu, Jiankun Hao, Xin Li, Rong Cheng, Kaiming Yang, Jinchun Hu
  • Patent number: 11703361
    Abstract: A five-degree-of-freedom heterodyne grating interferometry system comprises: a single-frequency laser for emitting single-frequency laser light, the single-frequency laser light can be split into a reference light beam and a measurement light beam; an interferometer lens set and a measurement grating for converting the reference light and the measurement light into a reference interference signal and a measurement interference signal; and multiple optical fiber bundles respectively receiving the measurement interference signal and the reference interference signal, wherein each optical fiber bundle has multiple multi-mode optical fibers respectively receiving interference signals at different positions on the same plane. The system is not over-sensitive to the environment, is small and light, and is easy to arrange.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: July 18, 2023
    Assignees: BEIJING U-PRECISION TECH CO., LTD., TSINGHUA UNIVERSITY
    Inventors: Ming Zhang, Yu Zhu, Fuzhong Yang, Leijie Wang, Rong Cheng, Xin Li, Weinan Ye, Jinchun Hu
  • Patent number: 11307018
    Abstract: A two-degree-of-freedom heterodyne grating interferometry measurement system, comprising: a single-frequency laser device for emitting a single-frequency laser, and the single-frequency laser can be split into a beam of reference light and a beam of measurement light; an interferometer mirror group and a measurement grating for forming a reference interference signal and a measurement interference signal from the reference light and the measurement light; and a receiving optical fiber for receiving the reference interference signal and the measurement interference signal, wherein a core diameter of the receiving optical fiber is smaller than a width of an interference fringe of the reference interference signal and the measurement interference signal, so that the receiving optical fiber receives a part of the reference interference signal and the measurement interference signal.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: April 19, 2022
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Yu Zhu, Ming Zhang, Leijie Wang, Fuzhong Yang, Rong Cheng, Xin Li, Weinan Ye, Jinchun Hu
  • Patent number: 10597172
    Abstract: Disclosed is a magnetic-fluid momentum sphere, which is used for satellite attitude adjustment. The magnetic-fluid momentum sphere comprises stators and a spherical shell. The stators are classified into three groups, axes of the three groups of stators are orthogonal to each other, each group comprises two stators arranged symmetrically about the center of the spherical shell, and the inner surfaces of the stators are spherical surfaces. The spherical shell is formed by combining two hemispherical shells, the material of the spherical shell is a non-ferromagnetic material, the inner surfaces of the stators closely adhere to the outer surface of the spherical shell, there is no relative movement between the spherical shell and the inner surfaces of the stators, and the spherical shell is filled with magnetic fluid. The magnetic-fluid momentum sphere achieves a small size and mass, low costs, and small coupling among the axes.
    Type: Grant
    Filed: July 18, 2016
    Date of Patent: March 24, 2020
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Yu Zhu, Anlin Chen, Ming Zhang, Kaiming Yang, Rong Cheng
  • Patent number: 10532832
    Abstract: A magnetic levitation reaction sphere includes a spherical-housing-shaped rotor and three groups of stators. Each group includes two stators using the sphere center of the rotor as a symcenter. Axes of the three groups are mutually orthogonal. Each stator comprises a stator core and a coil array. An air gap is reserved between an inner surface of each stator core and the outer surface of the rotor. Through grooves are radially formed in the stator cores. The coil arrays are disc-type motor stator windings. Two effective sides of each coil in each coil array are respectively placed in two through grooves of the corresponding stator core. The magnetic levitation reaction sphere has low cost; levitation and rotation driving are integrated; the magnetic levitation reaction sphere has a simple and compact structure, a small size and a low mass, and relates to inherent stable levitation; and the levitation control is simple.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: January 14, 2020
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Ming Zhang, Yu Zhu, Anlin Chen, Kaiming Yang, Rong Cheng, Feng Liu, Jinchun Hu, Chuxiong Hu, Dengfeng Xu, Haihua Mu
  • Patent number: 9995569
    Abstract: A six-degree-of-freedom displacement measurement method for an exposure region on a wafer stage, the wafer stage comprises a coil array and a movable platform. A planar grating is fixed below a permanent magnet array of the movable platform. A reading head is fixed in a gap of the coil array. A measurement region is formed on the planar grating by an incident measurement light beam of the reading head. The reading head measures the six-degree-of-freedom displacement of the measurement region, so that the six-degree-of-freedom displacement of the exposure region is obtained through calculation. In the method, the six-degree-of-freedom displacement of the exposure region at any time is measured; the measurement complexity is reduced and the measurement precision is improved, and especially, the six-degree-of-freedom displacement of the exposure region can be precisely measured at any time even if the movable platform has high flexibility.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: June 12, 2018
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Yu Zhu, Ming Zhang, Anlin Chen, Rong Cheng, Kaiming Yang, Feng Liu, Yujing Song, Fan Zhi, Jinchun Hu, Dengfeng Xu, Haihua Mu, Chuxiong Hu
  • Patent number: 9904183
    Abstract: A coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100) of the reticle stage, a balance mass (200), a drive motor, a mask plate (101, 102), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: February 27, 2018
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Yu Zhu, Ming Zhang, Fan Zhi, Zhao Liu, Rong Cheng, Kaiming Yang, Li Zhang, Huichao Qin, Yanpo Zhao, Li Tian, Weinan Ye, Jin Zhang, Wensheng Yin, Haihua Mu, Jinchun Hu
  • Patent number: 9791789
    Abstract: A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: October 17, 2017
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Ming Zhang, Yu Zhu, Fan Zhi, Rong Cheng, Kaiming Yang, Zhao Liu, Li Zhang, Huichao Qin, Yanpo Zhao, Li Tian, Weinan Ye, Jin Zhang, Wensheng Yin, Haihua Mu, Jinchun Hu