Patents Assigned to BEIJING WAITENKSIN ADVANCED TECHNOLOGY CO., LTD
  • Publication number: 20140153608
    Abstract: A method for measuring thickness or defect depth by pulsed infrared thermal wave technology is described. The method includes heating a measured object by pulsed heating devices, and at the same time, obtaining a thermal image sequence on the surface of the measured object by an infrared thermography device, and storing the thermal image sequence in a general-purpose memory. The method also includes multiplying a temperature-time curve at every point of the thermal image sequence by a corresponding time, thereby obtaining a new curve. The method also includes calculating a first-order differential and obtaining a peak time thereof. The method also includes use of one or more formulas to thereby determine the thickness or the defect depth of the measured object.
    Type: Application
    Filed: June 14, 2011
    Publication date: June 5, 2014
    Applicants: CAPITAL NORMAL UNIVERSITY, CHONGQING NORMAL UNIVERSITY, BEIJING WAITENKSIN ADVANCED TECHNOLOGY CO., LTD
    Inventors: Zhi Zeng, Xun Wang, Ning Tao, Lichun Feng