Abstract: The arrangement comprises a sewing apparatus which is partially supported below a material-supporting table and which partially extends through an opening above the table surface. Control means are provided to control the operation of the sewing apparatus as well as to feed the material to be sewn along each direction in which a seam is to be formed. Sensing means are provided to sense the fact that a seam has been completed. Also, means are provided which clamp the material to the table after each seam is sewn. The control means further include means to rotate the sewing apparatus and align it in such a way that when the material is again fed to the sewing apparatus, the latter sews a successive seam along a different selected direction.
Type:
Grant
Filed:
January 22, 1982
Date of Patent:
March 6, 1984
Assignee:
Beisler Gesellschaft mit beschrankter Haftung
Abstract: The arrangement comprises a sewing apparatus which is partially supported below a material-supporting table and which partially extends through an opening above the table surface. Control means are provided to control the operation of the sewing apparatus as well as to feed the material to be sewn along each direction in which a seam is to be formed. Sensing means are provided to sense the fact that a seam has been completed. Also, means are provided which clamp the material to the table after each seam is sewn. The control means further include means to rotate the sewing apparatus and align it in such a way that when the material is again fed to the sewing apparatus, the latter sews a successive seam along a different selected direction.
Type:
Grant
Filed:
September 24, 1980
Date of Patent:
March 9, 1982
Assignee:
Beisler Gesellschaft mit beschrankter Haftung