Abstract: A system and method for loading and unloading articles, especially adapted for moving semiconductor wafers into and out of a diffusion chamber. An article support is cantilevered for moving the articles into the chamber without touching it. A separately controllable cantilvered enclosure is provided for movement over the supported wafers when necessary for protection during the loading and/or unloading procedure. An inert gas controllably flows into the enclosure to provide a controlled atmosphere for the wafers during the loading and/or unloading procedure.