Abstract: An improved flexure support for a movable wafer or mask holders in photolithographic projection machines, comprising a long slender wire extending between the positioning device and the holder along the X or Y axis so as to constrain the holder to move along the axis while permitting substantial freedom of movement of the holder in a direction perpendicular to the wire by flexing, a bracket housing attached either to the holder or the positioning device with a hollow cavity filled with elastomeric material, and a plate in the cavity and attached to one end of the wire, to permit limited movement of the holder along the axis while it is being restrained against such movement by the positioning device.