Abstract: Semiconductor colloids grafted covalently with an antioxidant, the colloids being semiconductor colloids constituted by at least one element chosen from the group comprising C, Si, Ge, Sn, S, Se, Te, B, N, P, As, Al, Sb, Ga, In, Cd, Zn, O, Cu, Cl, Pb, Tl, Bi, Ti, U, Ba, Sr, Li, Nb, La, I, Mo, Mn, Ca, Fe, Ni, Eu, Cr, Br, Ag, Pt, Hg, and combinations thereof.

Abstract: A method of providing topical protection against atmospheric pollutant molecules and against ultraviolet (UV) radiation, said method comprising the steps of: a) forming a polymer matrix that is both repellent and antiadhesive to atmospheric pollutant molecules, by means of a first biocompatible polymer (BP1); b) under the effect of UV radiation, photocatalytically degrading the pollutant molecules that have penetrated into the polymer matrix by means of first semiconductor colloids (Col-1) grafted covalently with a second biocompatible polymer (BP2), thereby leading to formation of free radicals; c) neutralizing said free radicals by means of at least 2 antioxidants, namely: a first antioxidant in the form of second semiconductor colloids (Col-2) grafted covalently with said first antioxidant (AntiOx-1); the second grafted colloids (Col-2) self-regenerating under the action of the UV radiation; and a second antioxidant (AntiOx-2) that is not in the form of colloids grafted with an antioxidant; and d) st

Abstract: The present invention concerns a three-dimensional bipolymeric matrix deploying biological and biomechanical activity, able to neutralize the various physiopathological parameters involved in the development and worsening of skin lesions and/or sores, combining: a first polymeric network comprising first colloids (Col-1) bonded non-covalently to an unsulfated crosslinked polysaccharide; and a second polymeric network comprising second colloids (Col-2) bonded covalently or non-covalently to a sulfated polysaccharide.

Abstract: The present invention relates to a topical composition creating a photonic barrier from ultraviolet radiation to visible radiation, comprising bismuth oxide colloids Bi2O3 in crystalline form doped with a metal.

Abstract: A method of providing topical protection against atmospheric pollutant molecules and against ultraviolet (UV) radiation, said method comprising the steps of: a) forming a polymer matrix that is both repellent and antiadhesive to atmospheric pollutant molecules, by means of a first biocompatible polymer (BP1); b) under the effect of UV radiation, photocatalytically degrading the pollutant molecules that have penetrated into the polymer matrix by means of first semiconductor colloids (Col-1) grafted covalently with a second biocompatible polymer (BP2), thereby leading to formation of free radicals; c) neutralizing said free radicals by means of at least 2 antioxidants, namely: a first antioxidant in the form of second semiconductor colloids (Col-2) grafted covalently with said first antioxidant (AntiOx-1); the second grafted colloids (Col-2) self-regenerating under the action of the UV radiation; and a second antioxidant (AntiOx-2) that is not in the form of colloids grafted with an antioxidant; and d) st

Abstract: Semiconductor colloids grafted covalently with an antioxidant, the colloids being semiconductor colloids constituted by at least one element chosen from the group comprising C, Si, Ge, Sn, S, Se, Te, B, N, P, As, Al, Sb, Ga, In, Cd, Zn, O, Cu, Cl, Pb, Tl, Bi, Ti, U, Ba, Sr, Li, Nb, La, I, Mo, Mn, Ca, Fe, Ni, Eu, Cr, Br, Ag, Pt, Hg, and combinations thereof.