Patents Assigned to BOUTAGHOU LLC
  • Publication number: 20120064808
    Abstract: The intersection of discrete polishing islands staggered in a curvilinear shape with a workpiece maintains a substantially uniform film thickness throughout the polishing operation and also leading to a stable polishing operation due to the substantially invariant pressurization.
    Type: Application
    Filed: March 17, 2011
    Publication date: March 15, 2012
    Applicant: BOUTAGHOU LLC
    Inventor: Zine-Eddine Boutaghou
  • Publication number: 20110256803
    Abstract: An abrasive article with an abrasive element fabricated on a flexible foil suspended by a hydrostatic preloader, a gimball mechanism or a soft pad capable of selectively engaging with substrate to remove material while monitoring the contact pressure. A hydrostatic pressure bed is applied to the non-abrasive surface of the tensioned flexible foil to provide a contact pressure to the abrasive surface against the substrate. A series of fluid bearing surfaces are fabricated or imparted onto the abrasive side of the flexible foil to cause controlled interference and pressure with the substrate. A hydrostatic pressure emanating from the preloader supports the non-abrasive side of the flexible foil under tension while the abrasive side of the flexible foil engages a substrate.
    Type: Application
    Filed: March 17, 2011
    Publication date: October 20, 2011
    Applicant: BOUTAGHOU LLC
    Inventor: Zine-Eddine Boutaghou
  • Publication number: 20110244770
    Abstract: This invention relates to methods for plate dressing using slurry charged with abrasives and soft polymeric or metallic micro-nano spheres additives to produce substantially uniform abrasive height. Additionally, methods for plate dressing using slurry charged with abrasives and self-assembled polymers to produce substantially uniform abrasive height are disclosed.
    Type: Application
    Filed: April 4, 2011
    Publication date: October 6, 2011
    Applicant: BOUTAGHOU LLC
    Inventor: Zine-Eddine Boutaghou
  • Publication number: 20110230126
    Abstract: An abrasive article referred to as composite polishing pad (CPP) includes a plurality of fixed abrasive elements or a plurality of chemical mechanical polishing (CMP) pads attached to a plurality of pressure pads suspended to flexible structures capable to follow the wafer topography. A plurality of stems with dimpled ends act on the pressure pads to generate desired pressure acting on the wafer. The stems are attached to a spring arrangement capable of substantial vertical deflection under a desired load. In one embodiment a plurality of pressure pads suspended to a plurality of stems by revolute joints. The stems are attached to a spring arrangement capable of substantial vertical deflection under a desired load. In another embodiment, a plurality of pressure pads are attached to a plurality of stems suspended to a series of springs capable of substantial vertical deflection under a desired load.
    Type: Application
    Filed: March 17, 2011
    Publication date: September 22, 2011
    Applicant: BOUTAGHOU LLC
    Inventor: Zine-Eddine Boutaghou