Abstract: New polymers and anti-reflective or fill compositions including those polymers are provided. The polymer comprises recurring monomers according to the formula
wherein R comprises a light attenuating compound. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process.
Abstract: A photolithographic composition having improved processability and which eliminates the need for interlayering multiple special purpose coatings in the production of microelectronic devices is surprisingly made possible by selective dissolution of a polymer and an effective light attenuating material in critical solvents. The polymers which are used in the present invention include homopolymers and copolymers of poly(vinylpyridine).
Type:
Grant
Filed:
February 12, 1992
Date of Patent:
March 28, 1995
Assignee:
Brewer Science
Inventors:
Terry Brewer, James Lamb, III, J. Michael Mori
Abstract: Soluble conducting polymers from substituted polyanilines and large organic counterions are disclosed and used directly from solution in the manufacture of electronic devices.
Type:
Grant
Filed:
October 7, 1992
Date of Patent:
November 16, 1993
Assignee:
Brewer Science
Inventors:
Mary G. Moss, Terry L. Brewer, Tony D. Flaim