Abstract: The invention relates to a method of producing a substantially haze free, fluorine doped metal oxide coating on a substrate such as glass. The method includes the steps of heating a surface of the substrate to be coated, contacting the surface with a vapor including a metal oxide precursor, an oxidizing agent, and a dopant containing a chemically reactive vinylic fluorine atom, and thermally oxidizing the vapor into a fluorine containing metal oxide film.Another feature of the invention is an apparatus for producing a uniform, substantially haze free, fluorine containing metal oxide thin film coating on a substrate such as glass. The apparatus includes a heater to heat the substrate to between approximately 450.degree. and 600.degree. C. and a conveyor to convey the heated substrated to a reaction zone adjacent an injector head. The injector head produces a vapor containing a metal oxide precursor, an oxidizing agent, and a dopant containing a chemically reactive vinylic fluorine atom.

Abstract: A novel boat transfer and queuing furnace elevator and method includes an X, Z, and Y assembly movable between furnace processing tubes, a furnace loading island, and an operator work station. The X, Z, and Y assembly includes X, Z, and Y drive motors mounted in a region below the region defined by the operative transfer, queuing, loading, and unloading movement paths for preventing motor-produced pollutants from contaminating wafer-loaded boats. The X, Z, and Y assembly includes X, Z, and Y linkages having resilient members mounted along moving and mounting interfaces thereof for providing shock and vibration isolation. In one embodiment, the work station and furnace are arranged in-line, and in another embodiment the work station and furnace are arranged in laterally offset relation. In both embodiments, the X, Z, and Y assembly has a multi-mode operation capability that minimizes "dead time" between transfers and significantly improves system processing throughput.

Abstract: A longitudinally extending cross-flow liner within a longitudinally extending cylindrical reaction vessel cooperates with at least one longitudinally extending gas injector within the cross-flow liner to provide transversely flowing gas across the surfaces of vertically oriented semiconductor wafers in such a way as to substantially eliminate both depletion phenomenon and downstream wafer pollution caused from particulates, unreacted reactant gas, and other contaminants and to provide uniformly coated wafers in a batch and repeatability batch to batch.

Abstract: A high temperature electrical resistance heater in which an electrically resistive strip is supported so that the strip may freely expand and contract and substantially all of the strip may directly radiate to provide maximum heat transport therefrom. The strip is carried in a serpentine configuration by support blocks which are arranged in abutting relation in spaced, parallel rows. Each block includes a lower portion embedded in a ceramic base and an upper portion extending above the base. The upper portion includes a structural portion which encircles minor portions of the strip to carry it spaced above the base to allow substantially unimpeded radiation from the strip and free strip expansion. Anchors securely hold the support blocks embedded within the base.

Abstract: One fast cool-down furnace embodiment discloses a double wall in the interspace of which a cooling air stream is flowable to provide fast cool-down of a load of wafers. The double wall embodiment is retrofittable on existing diffusion furnaces, and includes a cylindrical member aligned in concentric relation with the diffusion tube by combination plenum defining and supporting manifolds. In a second embodiment, the fast cool-down furnace includes a reaction vessel and a heating core relatively movable relative to each other in such a way that in a fast cool-down condition the core and reaction vessel are spaced apart. Cooling tubes are embedded in the movable core. Fans or other aids to cooling are provided. Operation is either in a controlled cool-down mode or in a quick quench mode.

Abstract: One fast cool-down furnace embodiment discloses a double wall in the interspace of which a cooling air stream is flowable to provide fast cool-down of a load of wafers. The double wall embodiment is retrofittable on existing diffusion furnace, and includes a cylindrical member aligned in concentric relation with the diffusion tube by combination plenum defining and supporting manifolds. In a second embodiment, the fast cool-down furnace includes a reaction vessel and a heating core relatively movable relative to each other in such a way that in a fast cool-down condition the core and reaction vessel are spaced apart. Cooling tubes are embedded in the movable core. Fans or other aids to cooling are provided. Operation is either in a controlled cool-down mode or in a quick quench mode.

Abstract: A wafer softlanding system and cooperative door assembly are disclosed for gently and reliably loading and unloading a batch of wafers onto and off of the floor of a processing furnace tube. The disclosed softlanding system is coupled to a wafer receiving paddle and is operable to both linearly move the paddle as a whole in Z either upwardly or downwardly and to selectively rotatably move the paddle so that it tilts about an axis as it is moved linearly up and down. A door assembly is disclosed that includes a resiliently mounted furnace closure that is operative to provide a self-seating action at the mouth of the processing furnace tube. The door assembly includes in one embodiment a vacuum door closure and in another embodiment an atmospheric process door closure. In both embodiments, the closure members are readily releasable to provide for each of interchangeability, maintenance, and differential door size accommodation.

Abstract: The disclosed wafer handling system includes an input port, an input queue, and output port, and an output queue. The input and output queue each include a vertical elevator assembly capable of storing plural carriers representing multiple tube-loads of wafers input in the input port and into the output queue. A ferriswheel having multiple tube-load storage means is cooperative with an input waling beam and the input queue for arraying the plural carriers therein in multiple tube-loads of wafers each at different intermediate storage locations. A vertical transfer sub-assembly is cooperative with the ferriswheel and with a computer-controlled robot arm for transferring the wafers from each tube-load of carries to quartzware maintained by an inclinable transfer pad defining an elevator-transport access port.

Abstract: A generally cylindrical, self-supporting, unitary high-temperature electrical resistance heating element is disclosed. The heating element is composed of a wire grate formed from a plurality of electrically continuous and intersecting wire segments made of electrical resistance wire. The configuration of the heating element can be maintained by a plurality of circular rings made of conductive wire and placed orthogonally at intermediate points along the length of the heating element and which can serve as electrical terminals. The resulting heating element offers advantages of low weight, high efficiency and minimal thermal inertia, and provides a unitary heater structure which provides the ability to have different temperature zones along its length.

Abstract: A modular, self-diagnostic mass-flow controller and system includes separable and readily interchangeable housing portions cooperative to provide mass-flow controller component repair and replacement without further system disconnection. The mass-flow controller includes dual mass-flow sensors and associated electronics including a processor operative in response to the dual mass-flow sensor and other signals to both provide mass-flow control of a controlled gas and self-diagnostics to ensure that the controller is operating in its intended manner.

Abstract: A semi-cylindrical low-profile cantilevered paddle of refractory material is separably clamped to a cantilevered arm fastened to a movable boat-loader. A clamping mechanism is disclosed that preferably includes spaced brackets fastened to the arm defining retaining loops for slidably receiving the paddle. A flexible, stress-relief saddle portion is provided on one of the brackets. The rugged and breakage-resistant semi-cylindrical paddle is inexpensive to procure and replace, and its low profile makes it possible to adapt existing CVD furnaces for operation with larger semiconductor wafers.

Abstract: A multi-zone furnace having one or more walking beam conveyors operative in association with movable isolation doors to provide selective isolation of furnace zones and efficient transport and processing of a product through successive furnace zones.

Abstract: A novel modular V-CVD diffusion furnace includes a cylindrical quartz diffusion tube having integral end flanges, a first metallic sealing plate having gas ports removably fastened to one flange, a second metallic sealing plate having a plurality of precisely aligned gas injection tube receiving apertures removably fastened to the other flange, a like plurality of gas injection tubes slidably mounted in and sealed to corresponding gas injection tube receiving apertures, and a cylindrical quartz liner slidably mounted in the cylindrical diffusion tube.

Abstract: A method is disclosed for providing substantially effluent-waste free vacuum chemical vapor deposition of thin-film on semiconductor substrates. A first comparatively low efficiency diffusion furnace deposits selected thin-film on the semiconductor substrates. A second comparatively high-efficiency diffusion furnace operative in response to the effluent-waste stream of the first diffusion furnace deposits substantially all of the effluent-waste on throw-away baffles.

Abstract: A novel apparatus for forming depletion-free uniform thickness CVD thin-film on semiconductor wafers includes a diffusion furnace, a boat loader coupled to the furnace for loading and removing a batch of semiconductor wafers into and out of the furnace, and a semiconductor wafer support boat for removably retaining a plurality of vertically oriented semiconductor wafers on the boat. The boat includes supporting surfaces so arranged that depletion-free uniform thickness thin-film is provided on both sides of each of the vertically oriented wafers. The semiconductor wafer support boat preferably includes two laterally spaced elongated rails each having an undulatory longitudinal section defining plural ridge portions spaced apart by plural valley portions. The ridges on one of the rails are provided with transverse slots that cooperate with confronting transverse slots provided on the confronting ridge portions on the other one of the rails to define a plurality of wafer edge receiving channels.

Abstract: An automatic microprocessor-based control system for a diffusion furnace in which the controller is dedicated to a single associated diffusion tube to provide all monitoring and control functions necessary for a variety of diffusion processes. The controller provides direct digital control of time, temperature and gas flow, and can be readily operated with a variety of control algorithms.

Abstract: A high temperature electrical resistance heater for use within a high temperature furnace. The heater comprises an elongated tubular element which includes a first axially extending helical section of high resistance and a second axially extending tubular section which is contiguous with and electrically and thermally joined to the helical section and of low resistance. An elongated solid or tubular rod is disposed coaxially within the tubular element and is affixed at one end to the confronting end of the helical section. Fastening elements are provided to maintain the coaxial position of the rod within the tubular element and to maintain the helical section in compression. The coaxial ends of the rod and tubular section include electrical terminals for connection to an external power source. In an alternative embodiment, a second elongated tubular element is coaxially disposed within the first tubular element and includes both a helical section of high resistance and a tubular section of low resistance.

Abstract: A multiple beam furnace in which the beams can be selectively interconnected for removal as a single unit from the furnace and for replacement into the furnace as a single unit. The movable beams can be raised to a higher position above their normal operating height for engagement of an intermediately disposed fixed beam such that the engaged beams are laterally removable as a single unit from the furnace.

Abstract: A high temperature coil heater which is supported throughout its length in a manner to achieve substantial exposure of the coil to the product. A helically wound coil of resistance wire is supported continuously along its length by an anchor of electrically insulative high strength high thermal conductivity material and which in turn is bonded to a support member of electrically insulative low thermal conductivity low density material. The anchor embeds only a small segment of each coil turn and a major segment of the coil turns is disposed above the support member for efficient direct radiation to the product. Undesirable heat flow rearward of the coil is restricted by the low conductivity support member.

Abstract: A high temperature electrical resistance heater for use within a high temperature furnace. The heater is composed of an elongated tubular element having first and second tubular sections contiguous with one another, the first section being of a high resistivity silicon carbide and disposable within a furnace chamber, the second section being of a low resistivity silicon carbide and disposable external to the furnace chamber. An elongated rod of silicon carbide of low resistivity is disposed coaxially within the tubular element and in electrical connection with an end of the first tubular section. The coaxial ends of the second tubular section and of the rod include contact areas for electrical connection to an external power source. The high resistivity tubular section provides efficient heating, while the low resistivity tubular section and coaxial rod provide a conductive electrical path to the heating section while minimizing the heating thereof.