Patents Assigned to BVBA VANDERSTRAETEN
  • Sputtering targets and method for the preparation thereof
    Publication number: 20020125129
    Abstract: Sputtering targets comprising sub-stoichiometric titanium dioxide, TiOx, where x is below 2, are provided. The targets are preferably formed by plasma spraying so as to have an electrical resistivity of less than 0.5 ohm.cm.
    Type: Application
    Filed: December 7, 2001
    Publication date: September 12, 2002
    Applicant: BVBA VANDERSTRAETEN
    Inventor: Johan Emile Vanderstraeten