Abstract: There is provided a material treatment apparatus. The material treatment apparatus includes a first compartment. The first compartment includes an inlet for receiving supply of slurry material, and a first material conduction space for conducting flow of the supplied slurry material in a downwardly direction. A second compartment is also provided including a second material conduction space for receiving a first intermediate material of the supplied slurry material and conducting the first intermediate material in an upwardly direction. A baffle is provided for interfering with conducting of the supplied slurry material from the first material conduction space to the second material conduction space.