Patents Assigned to CAMBRIDGE GAN DEVICES LIMITED
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Patent number: 11955478Abstract: Power semiconductor devices in GaN technology include an integrated auxiliary (double) gate terminal and a pulldown network to achieve a normally-off (E-Mode) GaN transistor with threshold voltage higher than 2V, low gate leakage current and enhanced switching performance. The high threshold voltage GaN transistor has a high-voltage active GaN device and a low-voltage auxiliary GaN device wherein the high-voltage GaN device has the gate connected to the source of the integrated auxiliary low-voltage GaN transistor and the drain being the external high-voltage drain terminal and the source being the external source terminal, while the low-voltage auxiliary GaN transistor has the gate (first auxiliary electrode) connected to the drain (second auxiliary electrode) functioning as an external gate terminal.Type: GrantFiled: June 17, 2021Date of Patent: April 9, 2024Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Martin Arnold, Loizos Efthymiou, Florin Udrea, Giorgia Longobardi, John William Findlay
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Patent number: 11955488Abstract: We disclose a III-nitride semiconductor based heterojunction power device comprising: a first heterojunction transistor formed on a substrate, the first heterojunction transistor comprising: a first III-nitride semiconductor region formed over the substrate, wherein the first III-nitride semiconductor region comprises a first heterojunction comprising at least one two dimensional carrier gas; a first terminal operatively connected to the first III-nitride semiconductor region; a second terminal laterally spaced from the first terminal and operatively connected to the first III-nitride semiconductor region; a first plurality of highly doped semiconductor regions of a first polarity formed over the first III-nitride semiconductor region, the first plurality of highly doped semiconductor regions being formed between the first terminal and the second terminal; a first gate region operatively connected to the first plurality of highly doped semiconductor regions; and a second heterojunction transistor formed on thType: GrantFiled: October 31, 2022Date of Patent: April 9, 2024Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Florin Udrea, Loizos Efthymiou
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Patent number: 11923816Abstract: An integrated circuit is provided which can sense the drain voltage of an active heterojunction transistor under different conditions and can adjust a driving signal of a gate terminal of the active heterojunction transistor in order to limit conduction losses and/or switching losses.Type: GrantFiled: January 31, 2022Date of Patent: March 5, 2024Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Martin Arnold, Loizos Efthymiou, Florin Udrea, John William Findlay, Giorgia Longobardi
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Patent number: 11784637Abstract: The present disclosure relates to an edge detection circuit configured to receive an input signal comprising one or more falling or falling edges and provide an output signal comprising pulses or spikes corresponding to the one or more rising or falling edges. The edge detection circuit comprises a passive differentiator circuit configured to receive an input and provide a differentiator output signal that that is proportional to the rate of change of the input, and a comparator circuit operably connected to a voltage source. The comparator circuit is configured to receive the differentiator output signal, compare the differentiator output signal to a threshold voltage; and output a pulse or spike signal based on the comparison to the threshold voltage.Type: GrantFiled: May 10, 2022Date of Patent: October 10, 2023Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Sheung Wai Fung, Loizos Efthymiou, Florin Udrea, Martin Arnold
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Patent number: 11658236Abstract: A III-nitride semiconductor based heterojunction power device including: a first heterojunction transistor formed on a substrate, and a second heterojunction transistor formed on the substrate. One of the first heterojunction transistor and the second heterojunction transistor is an enhancement mode field effect transistor and the other one of the first heterojunction transistor and the second heterojunction transistor is a depletion mode field effect transistor. The enhancement mode transistor acts as a main power switch, and the depletion mode transistor acts as a start-up component.Type: GrantFiled: May 7, 2019Date of Patent: May 23, 2023Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Florin Udrea, Loizos Efthymiou, Giorgia Longobardi, Martin Arnold
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Patent number: 11211481Abstract: A heterojunction device, includes a substrate; a III-nitride semiconductor region located longitudinally above or over the substrate and including a heterojunction having a two-dimensional carrier gas; first and second laterally spaced terminals operatively connected to the semiconductor; a gate structure of first conductivity type located above or longitudinally over the semiconductor region and laterally spaced between the first and second terminals; a control gate terminal operatively connected to the gate structure, a potential applied to the control gate terminal modulates and controls a current flow through the carrier gas between the terminals, the carrier gas being a second conductivity type; an injector of carriers of the first conductivity type laterally spaced away from the second terminal; and a floating contact layer located over the carrier gas and laterally spaced away from the second terminal and operatively connected to the injector and the semiconductor region.Type: GrantFiled: January 13, 2020Date of Patent: December 28, 2021Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Florin Udrea, Loizos Efthymiou, Giorgia Longobardi
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Patent number: 11081578Abstract: We disclose herein a depletion mode III-nitride semiconductor based heterojunction device, comprising: a substrate; a III-nitride semiconductor region formed over the substrate, wherein the III-nitride semiconductor region comprises a heterojunction comprising at least one two-dimensional carrier gas of second conductivity type; a first terminal operatively connected to the III-nitride semiconductor region; a second terminal laterally spaced from the first terminal in a first dimension and operatively connected to the III-nitride semiconductor region; at least two highly doped semiconductor regions of a first conductivity type formed over the III-nitride semiconductor region, the at least two highly doped semiconductor regions being formed between the first terminal and the second terminal; and a gate terminal formed over the at least two highly doped semiconductor regions; wherein the at least two highly doped semiconductor regions are spaced from each other in a second dimension.Type: GrantFiled: May 7, 2019Date of Patent: August 3, 2021Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Florin Udrea, Loizos Efthymiou, Giorgia Longobardi, Martin Arnold
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Patent number: 11067422Abstract: We disclose herewith a heterostructure-based sensor comprising a substrate comprising an etched portion and a substrate portion; a device region located on the etched portion and the substrate portion; the device region comprising at least one membrane region which is an area over the etched portion of the substrate. At least one heterostructure-based element is located at least partially within or on the at least one membrane region, the heterostructure-based element comprising at least one two dimensional (2D) carrier gas.Type: GrantFiled: March 28, 2019Date of Patent: July 20, 2021Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Florin Udrea, Andrea De Luca, Giorgia Longobardi
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Patent number: 10818786Abstract: We disclose a III-nitride semiconductor based heterojunction power device, comprising: a first heterojunction transistor formed on a substrate, the first heterojunction transistor comprising: a first III-nitride semiconductor region formed over the substrate, wherein the first III-nitride semiconductor region comprises a first heterojunction comprising at least one two dimensional carrier gas of second conductivity type; a first terminal operatively connected to the first III-nitride semiconductor region; a second terminal laterally spaced from the first terminal and operatively connected to the first III-nitride semiconductor region; a first gate terminal formed over the first III-nitride semiconductor region between the first terminal and the second terminal.Type: GrantFiled: May 7, 2019Date of Patent: October 27, 2020Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Florin Udrea, Loizos Efthymiou, Giorgia Longobardi, Martin Arnold
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Patent number: 10593826Abstract: We disclose herewith a heterostructure-based infra-red (IR) device comprising a substrate comprising an etched portion and a substrate portion; a device region on the etched portion and the substrate portion, the device region comprising a membrane region which is an area over the etched portion of the substrate. At least one heterostructure-based element is formed at least partially within or on the membrane region and the heterostructure-based element comprises at least one two dimensional carrier gas.Type: GrantFiled: March 28, 2018Date of Patent: March 17, 2020Assignee: CAMBRIDGE GAN DEVICES LIMITEDInventors: Florin Udrea, Andrea De Luca, Giorgia Longobardi