Abstract: An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polari

Abstract: A process for coating a substrate comprising condensing a radiation curable material on a substrate and curing it using an electron flux 6? with energy between 6.5 eV and 300 eV. The electron flux 6? is directed at the substrate (2) either simultaneously or sequentially with delivery of the curable material (5?). Curing is preferably initiated spatially and temporally concurrently with delivery of the material to the substrate. The electron flux is preferably generated using a low pressure gas plasma source with a driving voltage negative relative to the local voltage conditions. The low pressure gas plasma (6?) is preferably magnetically enhanced and, for example, incorporates a magnetron.