Patents Assigned to Canadian Patents and Development Limited-Societe Candienne des Brevets et D'Exploitation (Limitee
  • Sputtering apparatus and method
    Patent number: 4498969
    Abstract: A apparatus and method is described for the magnetron sputtering of a workpiece to deposit a thin metallic film. A rotating magnetic field is provided in the vicinity of the workpiece to produce higher yield from a given cathode target.
    Type: Grant
    Filed: November 17, 1983
    Date of Patent: February 12, 1985
    Assignee: Canadian Patents and Development Limited-Societe Candienne des Brevets et D'Exploitation (Limitee
    Inventor: Kovilvila Ramachandran