Abstract: A substrate alignment apparatus for aligning a substrate with a reference point, comprises a plurality of columns configured to rotate about rotation axes parallel to respective axial directions thereof, a driving mechanism configured to synchronously rotate the plurality of columns through an identical angle in an identical direction, a detector configured to detect an amount of positional deviation of the substrate from the reference point, and support pins which are located on upper surfaces of the plurality of columns while being spaced apart from respective rotation axes of the plurality of columns, and are configured to support the substrate, wherein the substrate is aligned by synchronously rotating the plurality of columns through the identical angle in the identical direction by the driving mechanism based on the amount of positional deviation detected by the detector.