Patents Assigned to CANON SALES CO., and SEMICONDUCTOR PROCESS LABORATORY CO., LTD.
  • Film-forming surface reforming method and semiconductor device manufacturing method
    Publication number: 20010029109
    Abstract: There is provided a film-forming surface reforming method that comprises the steps of bringing a gas or an aqueous solution containing ammonia, hydrazine, amine, amino compound or their derivative into contact with a film-forming surface before an insulating film is formed on the film-forming surface of a substrate, and
    Type: Application
    Filed: March 15, 2001
    Publication date: October 11, 2001
    Applicant: CANON SALES CO., and SEMICONDUCTOR PROCESS LABORATORY CO., LTD.
    Inventors: Kazuo Maeda, Setsu Suzuki, Takayoshi Azumi, Kiyotaka Sasaki