Abstract: Silicate glasses for storing holographic data and for producing computer-generated holograms, including photo-darkenable-refractive (PDR) and photo-bleachable-refractive (PBR) glasses. In one embodiment, a PBR glass plate contains a photosensitive glass layer of a silver ion-exchanged holographic recording (SIHR) glass, with a base glass composition that has been ion-exchanged in an aqueous ion-exchange solution containing silver ions. The SIHR glass is uniformly darkened with darkening-light radiation, causing a refractive index change in the photosensitive glass layer upon exposure to bleaching-light radiation without any post-exposure steps. In another embodiment, an optical information recording medium includes a PDR glass plate containing SIHR glass optimized for multiplex recording and for reproducing information, which utilizes holography with darkening-light radiation as recording beams.

Abstract: Methods of making volume phase holograms and/or making computer-generated holograms using silver ion-exchanged silicate glass articles that include a photo-darkenable-refractive (PDR) glass plate and/or a photo-bleachable-refractive (PBR) glass plate. In one embodiment, a method of forming a volume phase hologram includes the steps of making a PBR glass plate that has at least one photosensitive glass layer of a silver ion-exchanged holographic recording (SIHR) glass, and of exposing the photosensitive glass layer to the bleaching-light radiation of laser write beams, causing the volume phase hologram to form in the photosensitive glass layer of the PBR glass plate. The base glass composition of the SIHR glass has been ion-exchanged in an aqueous ion-exchange solution containing silver ions. The SIHR glass is then uniformly darkened with darkening-light radiation.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for many applications.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for many applications.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for at least certain applications.

Abstract: The invention relates to a high energy beam-sensitive glass (HEBS glass) exhibiting insensitivity and/or inertness to actinic radiation. Silver ion exchange in acidic aqueous solution results in a slab waveguide having a constant refractive index in the thickness dimension. Low loss single mode as well as multimode waveguides were fabricated with a great precision in the designed thickness and step index .DELTA.n. Channel waveguides were patterned and fabricated in one process step within a HEBS glass via a lithographic printing method using a high energy beam. Alternatively, predesigned pattern of channel waveguides were fabricated instantaneously upon direct write with a laser beam pattern generator employing a focused laser beam, within a HEBS glass which has been flood exposed to a high energy beam.

Abstract: The invention relates to high energy beam-sensitive glass articles exhibiting insensitivity and/or inertness to actinic radiation, glass articles which are darkened and/or colored within a thin surface layer of about 0.1-3 .mu.m upon exposure to a high energy beam, electron beam, and ion beams in particular, without a subsequent development step, and which need no fixing to stabilize the colored image, since both the recorded image and the glass article are insensitive to radiation in the spectral range of uv and longer wavelengths. The instant invention is concerned with Ag.sup.+ ion-exchanged glass articles having base glass within alkali metal silicate composition fields containing at least one of the oxides of transition metals which have one to four d-electrons in an atomic state. The base glass composition can be varied widely, spontaneous reduction as well as photo-reduction of Ag.sup.+ ions are inhibited and/or eliminated due to the presence of said transition metal oxides in the glass article.