Patents Assigned to Cap1 Co., Ltd.
  • Publication number: 20100170025
    Abstract: A negative ion generating hat is provided. The hat is configured in a way that a predetermined space portion is formed between an inner of the hat and a lower band of the inner surface and a negative ion generating fabric is inserted into the space portion, thereby preventing a negative ion generating coating from being easily stripped off in spite of a stretching or creasing of a band.
    Type: Application
    Filed: June 30, 2009
    Publication date: July 8, 2010
    Applicant: CAP1 Co., Ltd.
    Inventor: Chul Woo Lee
  • Patent number: 7117542
    Abstract: The present invention discloses a headwear having a crown adapted to cover the top of a wearer's head, and a brim formed in a predetermined shape at the lower peripheral edge of the crown, and a rim formed along the inner peripheral surface of the lower peripheral edge of the crown, wherein the rim is made of an expandable spandex material and has a sewing line formed in a zigzag way along a portion where the upper and lower portions of the rim are folded to meet with each other so that the sewing line is strechable, the rim being sewn along the inner peripheral surface of the lower peripheral edge of the crown at the lower portion thereof.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: October 10, 2006
    Assignee: Cap1 Co., Ltd.
    Inventor: Chul-Woo Lee