Patents Assigned to Cark Zeiss SMT GmbH
  • Patent number: 9519209
    Abstract: The present inventions relates to a substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, wherein the coating comprises (a) at least one electrically conducting layer, and (b) wherein a thickness of the at least one layer is smaller than 30 nm, preferably smaller than 20 nm, and most preferably smaller than 10 nm.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: December 13, 2016
    Assignees: Fundació Institut de Ciències Fotòniques, Cark Zeiss SMT GmbH
    Inventors: Valerio Pruneri, Albert Carrilero, Jan-Hendrik Peters