Abstract: A mirror with a dielectric coating (2) on a substrate (3), wherein the dielectric coating (2) has exactly two layer stacks (4, 5), a first layer stack (4), on the substrate, of layers (41, 42) of high refractive index and low refractive index oxides in alternating arrangement and a second layer stack (5), arranged thereon, of layers of fluorides (52) and oxides (51) in alternating arrangement, and wherein the number of fluoride layers (52) as a proportion of the total number of layers of the dielectric coating (2) is less than 0.45.

Abstract: In a method for converting a light beam to a line focus, wherein the line focus extends according to its length along a first direction (y) and is narrow in a second direction (x) perpendicular to the first direction (y), the light beam is directed onto at least one conical optically operative surface, by which it is converted to the line focus. The light beam is directed onto the at least one optically operative surface with a ring-segment-shaped cross section transversely with respect to the light propagation direction. A device, in particular for carrying out the method, and an optical arrangement for generating a light beam with a ring-segment-shaped cross section are likewise described. In accordance with a further method and a further device, a line focus is generated only with spherical and/or cylindrical elements.

Abstract: The disclosure relates to an illuminating apparatus for illuminating a sample on a work stage, optionally with a relatively narrow illuminating line of relatively controlled energy, as well as methods for controlling energy of a laser source when illuminating a sample on a work stage with a relatively narrow illuminating line.

Abstract: A holding arrangement for an optical element, in particular for a cylindrical lens, includes a basic structure surrounding an optical element and a mounting device by which the optical element is supported on the basic structure. The mounting device has two degrees of freedom so that the optical element can be supported by the mounting device in a manner that allows the optical element to rotate about both about an optical axis and an axis perpendicular to the optical axis. If the optical element is a cylindrical lens, the axis perpendicular to the optical axis can be an axis perpendicular to an axial direction of the cylindrical lens. The disclosure further relates to a manipulator unit for an optical system which includes a holding arrangement.

Abstract: An EUV collector mirror shell of an EUV collector for EUV lithography includes a body which has a light incidence-side front part having a reflective optically active area, a rear part, and a cavity between the front and rear parts. The cavity extends essentially along the entire optically active area, and the cavity serves to receive a cooling medium. The body also has at least one inlet and at least one outlet for the cooling medium. A plurality of flow-influencing elements are in the cavity, extending from the front part to the rear part, and connecting the front part to the rear part and monolithically formed with the front and rear parts.

Abstract: An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s) is(are) arranged without direct contact with the optical element(s).

Abstract: A holding arrangement for an optical element includes a basic structure surrounding an optical element and a mounting device by which the optical element can be supported on the basic structure with two degrees of freedom for a rotational movement about an optical axis and a translational movement along a first axis which extends perpendicularly to the optical axis and intersects the optical axis in a center. The mounting device includes four joint locations arranged point-symmetrically with respect to the center and at least one parallel rocker which is displaceable parallel to the first axis. A manipulator unit includes a holding arrangement.

Abstract: An optical arrangement includes a light source which emits coherent light of a wavelength ?, and a diffraction grating which has a multiplicity of diffraction structures which follow one another periodically at the spacing of a grating period d and are arranged along a base surface, the individual diffraction structures respectively having a blaze flank and an antiblaze flank, the blaze flanks being arranged at an angle ? and the antiblaze flanks being arranged at an angle ? to the base surface, and respectively neighbouring blaze and antiblaze flanks enclosing an apex angle ?, and an incident light beam being arranged at a Littrow angle ?L relative to a grating normal of the diffraction grating.

Abstract: A mirror with a dielectric coating (2) on a substrate (3), wherein the dielectric coating (2) has exactly two layer stacks (4, 5), a first layer stack (4), on the substrate, of layers (41, 42) of high refractive index and low refractive index oxides in alternating arrangement and a second layer stack (5), arranged thereon, of layers of fluorides (52) and oxides (51) in alternating arrangement, and wherein the number of fluoride layers (52) as a proportion of the total number of layers of the dielectric coating (2) is less than 0.45.

Abstract: A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.

Abstract: A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ?1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.

Abstract: A holding arrangement for an optical element, in particular for a cylindrical lens, includes a basic structure surrounding an optical element and a mounting device by which the optical element is supported on the basic structure. The mounting device has two degrees of freedom so that the optical element can be supported by the mounting device in a manner that allows the optical element to rotate about both about an optical axis and an axis perpendicular to the optical axis. If the optical element is a cylindrical lens, the axis perpendicular to the optical axis can be an axis perpendicular to an axial direction of the cylindrical lens. The disclosure further relates to a manipulator unit for an optical system which includes a holding arrangement.

Abstract: An optical system for generating a light beam for treating a substrate arranged in a substrate plane is disclosed. The optical system includes first and second optical arrangements.

Abstract: An optical system for generating a light beam for treating a substrate in a substrate plane is disclosed. The light beam has a beam length in a first dimension perpendicular to the propagation direction of the light beam and a beam width in a second dimension perpendicular to the first dimension and also perpendicular to the light propagation direction. The optical system includes a mixing optical arrangement which divides the light beam in at least one of the first and second dimensions into a plurality of light paths incident in the substrate plane in a manner superimposed on one another. At least one coherence-influencing optical arrangement is present in the beam path of the light beam and acts on the light beam to at least reduce the degree of coherence of light for at least one light path distance of one light path from at least one other light path.

Abstract: A holding arrangement for an optical element includes a basic structure surrounding an optical element and a mounting device by which the optical element can be supported on the basic structure with two degrees of freedom for a rotational movement about an optical axis and a translational movement along a first axis which extends perpendicularly to the optical axis and intersects the optical axis in a center. The mounting device includes four joint locations arranged point-symmetrically with respect to the center and at least one parallel rocker which is displaceable parallel to the first axis. A manipulator unit includes a holding arrangement.

Abstract: The disclosure provides a bandwidth narrowing module for setting a spectral bandwidth of a laser beam of a laser light source. The bandwidth narrowing module includes a beam expanding module for expanding a laser beam transversely with respect to a propagation direction of the laser beam and comprising a reflection grating. A first optical component of the bandwidth narrowing module is configured so that a disturbance with a cylindrical portion about a first axis transversely with respect to an optical axis of the bandwidth narrowing module can be impressed on a wavefront of a laser beam. The first optical component is embodied such that it is pivotable about a pivoting axis parallel to the first axis.

Abstract: The invention relates to an optical delay module for lengthening the propagation path of a light beam comprises a first spherical mirror and a second spherical mirror, the first spherical mirror and the second spherical mirror having equal radii of curvature, the first and the second mirror being arranged on a common axis of symmetry with concave sides of the first and second mirrors being situated opposite one another at a distance from one another which corresponds to the radii of curvature of the first and second mirrors. The module also includes a coupling-in area for coupling the light beam into a space between the first and second mirrors and a coupling-out area for coupling the light beam out of the space between the first and second mirrors.

Abstract: An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element for clipping the angular distribution in the at least first direction. The approach according to the present invention bases on using an angle-selective device operated by the principle of total internal reflection to reduce divergence of the incoming beam, in contrast to a spatially-selective device as for example a field-stop or slit. The method according to the present invention has the advantage that no physical sharp edges have to be exposed at high energy densities. Thus, thermal impact and demands on the optical elements to withstand a high power laser beam are significantly reduced.

Abstract: A reflective optical element (10) for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.

Abstract: An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s) is(are) arranged without direct contact with the optical element(s).