Patents Assigned to Carl Zeiss MultiSEM GmbH
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Patent number: 11935721Abstract: A system includes a multi-beam particle microscope for imaging a 3D sample layer by layer, and a computer system with a multi-tier architecture is disclosed. The multi-tier architecture can allow for an optimized image processing by gradually reducing the amount of parallel processing speed when data exchange between different processing systems and/or of data originating from different detection channels takes place. A method images a 3D sample layer by layer. A computer program product includes a program code for carrying out the method.Type: GrantFiled: July 13, 2021Date of Patent: March 19, 2024Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Nico Kaemmer, Christian Crueger
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Patent number: 11735393Abstract: A method for operating a multi-beam particle beam microscope includes: scanning a multiplicity of particle beams over an object; directing electron beams emanating from impingement locations of the particle beams at the object onto an electron converter; detecting first signals generated by impinging electrons in the electron converter via a plurality of detection elements of a first detection system during a first time period; detecting second signals generated by impinging electrons in the electron converter via a plurality of detection elements of a second detection system during a second time period; and assigning to the impingement locations the signals which were detected via the detection elements of the first detection system during the first time period, for example on the basis of the detection signals which were detected via the detection elements of the second detection system during the second time period.Type: GrantFiled: March 25, 2021Date of Patent: August 22, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Gregor Dellemann, Gunther Scheunert
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Patent number: 11657999Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.Type: GrantFiled: June 21, 2021Date of Patent: May 23, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert
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Method for detector equalization during the imaging of objects with a multi-beam particle microscope
Patent number: 11645740Abstract: A method for detector equalization during the imaging of objects with a multi-beam particle microscope includes performing an equalization on the basis of individual images in or on the basis of overlap regions. For detector equalization, contrast values and/or brightness values are used and iterative methods can be employed.Type: GrantFiled: March 4, 2021Date of Patent: May 9, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Michael Behnke, Stefan Schubert, Christof Riedesel -
Patent number: 11562880Abstract: A particle beam system includes: a particle source to generate a beam of charged particles; a first multi-lens array including a first multiplicity of individually adjustable and focusing particle lenses so that at least some of the particles pass through openings in the multi-lens array in the form of a plurality of individual particle beams; a second multi-aperture plate including a multiplicity of second openings downstream of the first multi-lens array so that some of the particles which pass the first multi-lens array impinge on the second multi-aperture plate and some of the particles which pass the first multi-lens array pass through the openings in the second multi-aperture plate; and a controller configured to supply an individually adjustable voltage to the particle lenses of the first multi-lens array and thus individually adjust the focusing of the associated particle lens for each individual particle beam.Type: GrantFiled: March 23, 2021Date of Patent: January 24, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Hans Fritz, Ingo Mueller, Georgo Metalidis
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Patent number: 11562881Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: October 28, 2021Date of Patent: January 24, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 11239053Abstract: Charged particle beam systems and methods, such as a multi beam charged particle beam system and related methods, can compensate sample charging.Type: GrantFiled: August 25, 2020Date of Patent: February 1, 2022Assignee: Carl Zeiss MultiSEM GmbHInventor: Dirk Zeidler
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Patent number: 11239054Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.Type: GrantFiled: November 16, 2020Date of Patent: February 1, 2022Assignee: Carl Zeiss MultiSEM GmbHInventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
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Patent number: 11164715Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: September 15, 2020Date of Patent: November 2, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 11158482Abstract: A multi-beam particle microscope includes a multi-beam particle source, an objective lens, a detector arrangement, and a multi-aperture plate with a multiplicity of openings. The multi-aperture plate is between the objective lens and the object plane. The multi-aperture plate includes a multiplicity of converters which convert backscattered electrons which are generated by primary particle beams at an object into electrons with a lower energy, which provide electrons that form electron beams detected by the detector arrangement.Type: GrantFiled: August 14, 2020Date of Patent: October 26, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert
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Patent number: 11087955Abstract: A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.Type: GrantFiled: July 27, 2020Date of Patent: August 10, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Michael Schall, Joerg Jacobi, Michel Le Maire
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Patent number: 11087948Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.Type: GrantFiled: July 28, 2020Date of Patent: August 10, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Thomas Kemen, Christof Riedesel, Ralf Lenke, Joerg Jacobi
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Patent number: 11069508Abstract: A fast method of imaging a 3D sample with a multi-beam particle microscope includes the following steps: providing a layer of the 3D sample; determining a feature size of features included in the layer; determining a pixel size based on the determined feature size in the layer; determining a beam pitch size between individual beams in the layer based on the determined pixel size; and imaging the layer of the 3D sample with a setting of the multi-beam particle microscope based on the determined pixel size and based on the determined beam pitch size.Type: GrantFiled: January 6, 2020Date of Patent: July 20, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Anna Lena Eberle
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Patent number: 11049686Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.Type: GrantFiled: November 25, 2019Date of Patent: June 29, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert
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Patent number: 10896800Abstract: A charged particle beam system includes a charged particle source, a multi beam generator, an objective lens, a projection system, and a detector system. The projection system includes a first subcomponent configured to provide low frequency adjustments, and the projection system comprises a second subcomponent configured to provide a high frequency adjustments.Type: GrantFiled: August 2, 2019Date of Patent: January 19, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Christoph Riedesel, Dirk Zeidler
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Patent number: 10854423Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.Type: GrantFiled: February 15, 2019Date of Patent: December 1, 2020Assignee: Carl Zeiss MultiSEM GmbHInventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
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Patent number: 10811215Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: May 20, 2019Date of Patent: October 20, 2020Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 10741355Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.Type: GrantFiled: February 4, 2019Date of Patent: August 11, 2020Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Thomas Kemen, Christof Riedesel, Ralf Lenke, Joerg Jacobi