Abstract: A method for reducing the contamination of at least one optical component (2, 3) contained in the beam guidance space (6) and held by a frame (4, 5) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer (7) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.

Abstract: A medical handpiece for transmitting energy from a laser beam into biological tissue. An optical fiber for conveying the laser beam to the handpiece and a light guide for radiating the laser energy into the tissue are arranged in a base body. Means are provided for aligning the optical axis of the light guide in relation to the optical axis of the fiber and means for aligning the optical axis of the light guide in relation to the base body are also provided. The light guide can be displaced in an axial direction in relation to the base body and the alignment can be set according to the direction of displacement or maintained. The light guide is easy to replace and the device is easy to clean in accordance with all hygiene requirements.

Abstract: A process for confocal microscopy is disclosed in which laser light is coupled into a microscope beam path, directed successively with respect to time onto different locations of a specimen, and an image of the scanned plane is generated from the light reflected and emitted by the irradiated locations. A change in the spectral composition and in the intensity of light is carried out during the deflection of the laser beam from location to location, while the deflection continues in an uninterrupted manner. In this way, at least two locations of the specimen located next to one another are acted upon by light with different spectral characteristics and by laser radiation of different intensity. By periodically interrupting the coupling in of the laser light during the deflection of the microscope beam path, it is made possible that only selected portions of the image field are acted upon by the laser radiation. A laser scanning microscope for carrying out this process is also disclosed.

Abstract: A rotary bearing, in particular for optical measuring technology, such as measuring the image fidelity of an optical element, with an aperture and central axis, is provided with an outer mounting part (1) and with an inner bearing part (2). The inner bearing part (2) is connected to a drive output part (6), which can be rotated with respect to the outer mounting part (1) about the central axis. The outer mounting part (1) and the inner bearing part (2) lie in a common plane and are interconnected by articulated joints. The inner bearing part (2) is divided into a plurality of segments, which are respectively connected to the drive output part (6) via resilient articulated joints.

Abstract: The invention is directed to an optical unit having elements (6, 7) which are juxtaposed without an air gap therebetween. The two elements (6, 7) are joined by wringing the same to each other. At least one element (7) is of crystalline material and has an amorphous inorganic layer (70) on the side thereof facing toward the other element (6). The invention is also directed to a method of preparing an element made of crystalline material, such as a fluoride, as well as a method for making a thin optical element of the crystalline material.

Abstract: Mirror substrate consisting of crystal, especially silicon crystal, on which an amorphous layer, especially a quartz glass layer, is applied.

Abstract: An optical arrangement is disclosed wherein an entering beam is converted into an exiting beam having a total cross section of light which is linearly polarized essentially in the radial direction by rotation. For this purpose, rasters of half-wave plates (41, 42, 4i), a combination of birefringent quarter-wave plate 420 and a circular plate 430 is suggested in combination with a conical polarizer 21′. This arrangement is preferably utilized in the illumination portion of a microlithographic projection exposure system. It is important that the arrangement be mounted behind all asymmetric or polarizing component elements 103a.

Abstract: An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the same material is arranged before the entrance surface of the rod. The aspect ratio between width and height of the small rods is the inverse of the aspect ratio between width and height of the rod. The rod arrangement, or some analogous structure, surface or treatment substituted therefor, serves to compensate the direction-dependent total reflection losses of the rod.

Abstract: The invention is directed to a coordinate measuring apparatus having drives (14, 23) for moving the components (2, 7) of the apparatus. The drives are displaced in accordance with sets of desired drive values (Li, Fdes) which are sequentially pregiven at a fixed clock frequency. The operation of the control can be integrated into a control computer unit (3, 4, 5) by making available a control computer unit (3, 4, 5) having an operating system without real-time performance in which the desired drive values (Li, Fdes) are correspondingly computed as well as by providing a subassembly (1) wherein the desired drive values (Li, Fdes) can be stored and driven to at subsequent clock pulses in advance in response to a command of the control computer unit (3, 4, 5).

Abstract: One embodiment of the present invention is an optical delay line that comprises a plurality of optical elements in optical communication with each other, wherein: (a) at least one of the plurality of optical elements is capable of spatially dispersing a spectrum of an optical signal to provide a spatially dispersed optical signal; (b) at least one of the plurality of optical elements is adjustable to affect one or more of a phase delay and a group delay of an optical signal; and (c) at least one of the plurality of optical elements compensates for polarization introduced into the optical signal by others of the optical elements.

Abstract: In the case of a lens system, in particular a projection lens system in semiconductor lithography, with a plurality of optical elements, such as lenses, which are mounted in mounts, the mounts being connected to one another, if appropriate by means of adjusting rings, at least one inner mount of an optical element which is intended for removal and/or later fitting is connected to an outer mount by means of a three-point mounting.

Abstract: An optical element housing or mounting connector (4), in particular for lens elements (13) in lens systems (12) for semi-conductor-lithography projection printing machines, is provided with electro-permanent magnets (1), the electro-permanent magnets being magnetized by the magnetic field of a coil (5) connected to an activating device (8) in such a way that the housings or mountings (4) are connected to one another by magnetic forces.

Abstract: An optical imaging device, in particular a lens system, has a system diaphragm (1). An aperture of the system diaphragm (1) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm (1) with respect to the optical axis (4) of the system diaphragm (1) is fixed in dependence on the opening diameter (D) of the system diaphragm (1).

Abstract: An illuminating device of a projection-microlithographic device includes a light source, an objective, and a device which produces a particular image field configuration. The device has fields which, in the direction of scanning movement, are separated at least in parts by a free zone, and are located in a peripheral region of the circular image field of a downstream projection objective in a manner at least approximating rotation symmetry. The integral of the quantity of light passing through the fields in the scanning direction are constant over the entire extent of the image field configuration in the direction at right angles to the scanning direction. Such an image field configuration replaces a conventional rectangular scanner slot formation whose width in the scanning direction corresponds to the forementioned integral of the image field configuration. The design of the image field configuration permits an approximately rotationally symmetric illumination of the projection objective.

Abstract: An arrangement in which light is directed onto a surface proceeding from a light source by first optics, so that an image is formed which can be detected by second optics, the arrangement having first, second and third partial optics and an optical axis as common optical axis for the first partial optics (22) and second partial optics (24) by which the second optics are formed. The light coming from the third partial optics and incident in the second partial optics encloses an angle relative to the common optical axis at which the third partial optics lie outside of an area traversed by the light reflected by the reflecting surface from the second partial optics (24) to the first partial optics (22).

Abstract: A device for the low-deformation support of an optical element (2), in particular of an end plate of a lens in a projection printing system for semiconductor elements, is provided with a mount (1), the optical element (2) being connected to the mount (1) at least partly via a bonding layer which is located between the adjacent circumferential walls (4, 5) of mount (1) and optical element (2). The mount (1) is provided with at least three bearing feet (3) which are distributed over the circumference and on which the optical element (2) rests. The bonding layer is located in an annular gap (6) between the adjacent circumferential walls (4, 5) of mount (1) and optical element (2) over at least one section thereof.

Abstract: In a coordinate measurement device with a base frame, a measurement table supported at the latter for holding an object to be measured, a sensing device for sensing the surface of this object, and with a positioning device for moving the sensing device in three spatial axes over the measurement table, which positioning device is mounted at the base frame and carries the sensing device, the positioning device has a first slide which is guided at the base frame in a first direction and which is movable on one side of the measurement table toward and away from the latter and on which a second slide is movable in a second direction vertical to the first direction, this second slide being provided at its end area remote of the measurement table (considered in its movement direction) with a supporting portion which projects lateral to the measurement table and at which there is arranged a stirrup arm which projects over the measurement table in a direction vertical to a principal work plane of the measurement table

Abstract: In a method for coating optical elements for systems working with ultraviolet light, the coating process is performed in the evacuable working chamber of a coating system. At least one lock system is provided, equipped with a lock chamber that can be evacuated and, if desired, separated from the working chamber or connected to the working chamber in order to introduce optical elements. After the optical elements are moved into the lock chamber, different treatment steps may be performed there on the elements that were, or will be, coated. The treatment may include in particular cleansing with ultraviolet light, controlled heating or cooling, and/or measurement of at least one optical property of the optical elements. Using the lock chambers for the pre-treatment and post-treatment of optical elements immediately before or after a coating process permits improved control of the coating process and production of elements of highest quality with minimal total processing time.

Abstract: A reduction objective, a projection exposure apparatus with a reduction objective, and a method of use thereof are disclosed. The reduction objective has a first set of multilayer mirrors in centered arrangement with respect to a first optical axis, a second set of multilayer mirrors in centered arrangement with respect to a second optical axis, and an additional mirror disposed at grazing incidence, such that said additional mirror defines an angle between the first optical axis and said second optical axis. The reduction objective has an imaging reduction scale of approximately 4× for use in soft X-ray, i.e., EUV and UV, annular field projection applications, such as lithography.

Abstract: Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.