Abstract: A microscope, comprising an observation beam path that renders an eye to be examined observable, a wavefront measuring device for measuring the refraction of the eye to be examined, an OCT device comprising an OCT illumination beam path, by means of which OCT illumination radiation can be focused as an OCT spot into the eye to be examined, and a control unit that is supplied with at least one measurement value of the wave front measuring device, is provided, wherein the control unit sets the beam diameter and/or the beam shape of the OCT spot on the basis of the at least one supplied measurement value.

Abstract: A microscopy method includes illuminating an object with illumination light, recording a first color image of the illuminated object by a color image sensor suitable for recording colors of a first gamut, producing a second color image of the object, the second color image including pixels that each have assigned a color from a second gamut, depicting the second color image by a display apparatus suitable for rendering colors of the second gamut, wherein the producing the second color image includes determining the colors at the pixels of the second color image by applying a color transfer function to the colors of the corresponding pixels of the first color image, the color transfer function mapping input colors onto output colors, and the color transfer function mapping those input colors that belong to the first gamut but not to the second gamut onto output colors that belong to the second gamut.

Abstract: A surgical device for cutting a lens within a capsular bag of an eye. Related methods, systems, and devices are also provided.

Abstract: A method and a device for measuring the topography and/or the gradients and/or the curvature of an optically active surface of an object are disclosed. The device allows the object to be arranged in a receiving region with a contact surface for contact with the object. Inside the device, there is a plurality of point light sources that provide light that is reflected at the surface to be measured of an object arranged in the receiving region. The device includes at least one camera with an objective assembly and an image sensor for detecting a brightness distribution which is produced on a light sensor by the light of the point light sources reflected at the surface to be measured.

Abstract: A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catalytic or chemically active layer (110), and wherein the catalytic or chemically active layer (110) and/or a carrier (230, 240) bearing this layer (110) is porous.

Abstract: An immersion objective having a highly refractive single front lens and, immediately adjacent a beam waist, a cemented triplet group with a focal length less than or equal to ?1.5 times the focal length of the immersion objective.

Abstract: A control apparatus for a phacoemulsification system is disclosed. The control apparatus is configured to supply electrical energy to an actuator for a phaco needle during a plurality of time intervals, wherein the time intervals includes a first time interval, in which electrical energy for pulses with a constant maximum amplitude is supplied, a second time interval following the first time interval, wherein electrical energy with a value equal to zero is supplied, and a third time interval following the second time interval, wherein the third time interval has a first time duration in which electrical energy for pulses which have a lower constant amplitude than the maximum amplitude during the first time interval is supplied.

Abstract: Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates (1) including a base body (2) made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body (2) is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer (6) is preferably provided on a polishing layer (3) of the substrate (1) of the EUV mirror (5).

Abstract: An illumination optical unit for projection lithography illuminates an object field with illumination light along an illumination beam path. The arrangement of field facets of a field facet mirror and also of pupil facets of a pupil facet mirror is such that an illumination channel is guided over each of them. The field facet mirror images a light source image along in each case one illumination channel onto one of the pupil facets. The pupil facet mirror superimposedly images of the field facets into the object field. The illumination optical unit is designed for the settable specification of a spatial resolution of an illumination light illumination of an entrance pupil of a projection optical unit arranged downstream of the object field in the illumination light beam path. The result of this is an illumination optical unit with which illumination light can be used efficiently for high-contrast imaging of the structures to be projected.

Abstract: An optical assembly guides an output beam of a free electron laser to a downstream illumination-optical assembly of an EUV projection exposure apparatus. The optical assembly has first and a second GI mirrors, each with a structured reflection surface to be impinged upon by the output beam. A first angle of incidence on the first GI mirror is between one mrd and 10 mrad. A maximum first scattering angle is produced, amounting to between 50% and 100% of the first angle of incidence. A second angle of incidence on the second GI mirror is at least twice as large as the first angle of incidence. A maximum second scattering angle of the output beam amounts to between 30% and 100% of the second angle of incidence. The two planes of incidence on the two GI mirrors include an angle with respect to one another that is greater than 45°.

Abstract: The invention relates to an inspection device for masks for semiconductor lithography, comprising an imaging device for imaging a mask, and an image recording device, wherein one or more correction bodies which exhibit a dispersive behavior for at least one subrange of the illumination radiation used for the imaging are arranged in the light path between the mask and the image recording device. The invention furthermore relates to a method for taking account of longitudinal chromatic aberrations in inspection devices for masks, comprising the following steps: recording a specific number of images having differently defocused positions, and selecting a subset of the images and simulating a longitudinal chromatic aberration of a projection exposure apparatus.

Abstract: A laser treatment unit for performing eye surgery, including a contact glass which can be placed onto the eye and through which a treatment laser beam (2) passes. A safety mechanism displaceably holds the contact glass such that the contact glass retreats when the contact glass is subjected to the action of a force contrary to the direction of incidence of the laser beam. The safety mechanism enables this retreating when a force is greater than a force limit value (Fmin) and holds the contact glass in a fixed manner when the force is less than the force limit value.

Abstract: A series of spectacle lenses is disclosed, wherein each lens has a spherical front surface and an aspheric, atoric, or freeform back surface. Further, each lens of the series provides a focal power Px between ?6 D and +4 D; and at least one lens of the series provides a focal power Px between at least one of (a) ?0.75 D and +2.25 D and (b) ?0.5 D and +2.00 D. For an upper range of focal powers, lenses having the same nominal front surface power are provided; and for a lower range of trough powers, lenses having the same minimum nominal back surface power are provided. The spherical front surface has a nominal front surface power Pf and the back surface has a minimum nominal back surface power Pb; wherein 15.5 D?|Pf|+|Pb|+|Px|?31.5 D applies for each spectacle lens of the series.

Abstract: A specimen of an artificial marker is arranged on an object, the position of which is to be determined. The artificial marker defines a nominal marker pattern with nominal characteristics. The specimen embodies the nominal marker pattern with individual characteristics. One or more images of the specimen are captured while the specimen is arranged on the object. An image representation of the specimen is analyzed using a data set. The data set comprises measured data values representing the individual characteristics as individually measured on the first specimen. Position values representing a 3D position of the specimen relative to a coordinate system are determined. A 3D position of the object is determined based on the position values of the specimen.

Abstract: A method for determining an arrangement of a sample object in an optical device comprises illuminating the sample object from at least one first illumination direction and illuminating the sample object from at least one second illumination direction. The method also comprises carrying out a correlation between data which are indicative of at least one section of an image of the sample object under illumination from the at least one first illumination direction and data which are indicative of at least one section of an image of the sample object under illumination from the at least one second illumination direction. The method also comprises determining the arrangement of the sample object in relation to a focal plane of the optical device based on the correlation.

Abstract: A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.

Abstract: For a working wavelength in the range from 1 nm to 12 nm, a reflective optical element has, on a substrate, a multilayer system that includes at least two alternating materials having a different real part of the refractive index at the working wavelength. The multilayer system includes a first alternating material from the group formed from thorium, uranium, barium, nitrides thereof, carbides thereof, borides thereof, lanthanum carbide, lanthanum nitride, lanthanum boride, and a second alternating material from the group formed from carbon, boron, boron carbide, or lanthanum as first alternating material and carbon or boron as second alternating material. It has, on the side of the multilayer system remote from the substrate, a protective layer system including a nitride, an oxide and/or a platinum metal.

Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus, has an optical effective surface and includes a substrate (11, 61, 71, 81, 91), a reflection layer system (16, 66, 76, 86, 96) for reflecting electromagnetic radiation impinging on the optical effective surface (10a, 60a, 70a, 80a, 90a), an electrode arrangement (13, 63, 73, 83) composed of a first material having a first electrical conductivity, the electrode arrangement being provided on the substrate, and a mediator layer (12, 62, 72, 82, 92) composed of a second material having a second electrical conductivity. The ratio between the first electrical conductivity and the second electrical conductivity is at least 100. The mirror also includes at least one compensation layer (88) which at least partly compensates for the influence of a thermal expansion of the electrode arrangement (83) on the deformation of the optical effective surface (80a).

Abstract: Embodiments of the invention relate to an intraocular lens system having a plurality of haptics for use with an optic. In general, the haptics are adapted to move independently in response to forces associated with a ciliary muscle and/or zonules of an eye when implanted. The optic may be releasably secured to the system using, for example, a plurality of optic securing arms. Alternatively, the optic may be fused to the haptics, which may project radially outward from the optic. A restraining arm may be included to limit movement of the haptics during accommodation and/or disaccommodation. Clamping members may be included for securing the system to a capsular bag of the eye. Methods of implanting the intraocular lens system into the eye are also described.