Patents Assigned to CDM Optics, Inc.
  • Publication number: 20100066809
    Abstract: A deployable image sensor includes a detector operable to generate electronic data in accordance with electromagnetic energy incident thereon, optics operable to direct the electromagnetic energy toward the detector, and electronics in electrical communication with the detector, the electronics operable to transmit the electronic data. A structure supports the detector, the optics, and the electronics. A shell surrounds at least a part of the structure, the shell and the structure defining a space therebetween such that the structure is reorientable within the shell. The deployable image sensor may include a battery array that may be charged using a charging station. A base station may be used with the deployable image sensor.
    Type: Application
    Filed: February 15, 2007
    Publication date: March 18, 2010
    Applicant: CDM OPTICS, INC.
    Inventors: Robert H. Cormack, Christopher J. Linnen, Inga Tamayo, W. Thomas Cathey, JR., Joseph C. Dagher
  • Publication number: 20090096882
    Abstract: Systems and methods include optics having one or more phase modifying elements that modify wavefront phase to introduce image attributes into an optical image. A detector converts the optical image to electronic data while maintaining the image attributes. A signal processor subdivides the electronic data into one or more data sets, classifies the data sets, and independently processes the data sets to form processed electronic data. The processing may optionally be nonlinear. Other imaging systems and methods include optics having one or more phase modifying elements that modify wavefront phase to form an optical image. A detector generates electronic data having one or more image attributes that are dependent on characteristics of the phase modifying elements and/or the detector. A signal processor subdivides the electronic data into one or more data sets, classifies the data sets and independently processes the data sets to form processed electronic data.
    Type: Application
    Filed: April 3, 2007
    Publication date: April 16, 2009
    Applicant: CDM OPTICS, INC.
    Inventors: Gregory Johnson, Edward Dowski, Kenneth Kubala, Ramkumar Narayanswamy, Hans Wach
  • Publication number: 20080012955
    Abstract: Systems and methods include optics having one or more phase modifying elements that modify wavefront phase to introduce image attributes into an optical image. A detector converts the optical image to electronic data while maintaining the image attributes. A signal processor subdivides the electronic data into one or more data sets, classifies the data sets, and independently processes the data sets to form processed electronic data. The processing may optionally be nonlinear. Other imaging systems and methods include optics having one or more phase modifying elements that modify wavefront phase to form an optical image. A detector generates electronic data having one or more image attributes that are dependent on characteristics of the phase modifying elements and/or the detector. A signal processor subdivides the electronic data into one or more data sets, classifies the data sets and independently processes the data sets to form processed electronic data.
    Type: Application
    Filed: April 3, 2007
    Publication date: January 17, 2008
    Applicant: CDM OPTICS, INC.
    Inventors: Gregory Johnson, Edward Dowski, Kenneth Kubala, Ramkumar Narayanswamy, Hans Wach
  • Patent number: 7319783
    Abstract: A method for reducing optical distortion within an optical system employing adaptive optics, includes modifying phase of a wavefront of the optical system with a wavefront coding element. Image data of the optical system is post-processed to remove phase effects induced by the wavefront coding element, to reduce optical distortion caused by the adaptive optics and associated with one or more of quilting, stuck actuator and piston error.
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: January 15, 2008
    Assignee: CDM Optics, Inc.
    Inventors: Edward Raymond Dowski, Jr., Kenneth Scott Kubala, Alan Eugene Baron
  • Publication number: 20070263280
    Abstract: A far infrared imaging system includes one or more optical elements that effects a predetermined phase modification, a detector that converts an image formed by the one or more optical elements into electronic data, and a post processor for processing the electronic data.
    Type: Application
    Filed: May 9, 2007
    Publication date: November 15, 2007
    Applicant: CDM OPTICS, INC.
    Inventors: Kenneth Macon, Joel Rutkowski, Miodrag Scepanovic, Hans Wach, Vladislav Chumachenko
  • Publication number: 20070247725
    Abstract: Zoom lens systems and methods for imaging incoming rays over a range of ray angles are disclosed. The incoming rays are characterized by at least phase. The zoom lens system includes an optical axis and is characterized by a plurality of modulation transfer functions (MTFs) corresponding at least to the range of ray angles. The zoom lens system includes an optical group disposed along the optical axis, including at least one variable optical element that has a variable focal length selectable between at least two distinct focal length values. The optical group also includes a wavefront coding element. The wavefront coding element alters at least the phase of the incoming rays, such that the plurality of MTFs corresponding to the range of ray angles, for each one of the two distinct focal length values, are less sensitive to misfocus-like aberrations than a corresponding system without the wavefront coding element.
    Type: Application
    Filed: March 6, 2007
    Publication date: October 25, 2007
    Applicant: CDM OPTICS, INC.
    Inventors: Edward Dowski, Satoru Tachihara, Robert Cormack
  • Patent number: 7260251
    Abstract: An imaging system for reducing aberrations from an intervening medium, and an associated method of use are provided. The system may be an optical or task-based optical imaging system including optics, such as a phase mask, for imaging a wavefront of the system to an intermediate image and modifying phase of the wavefront such that an optical transfer function of the system is substantially invariant to focus-related aberrations from the medium. A detector detects the intermediate image, which is further processed by a decoder, removing phase effects from the optics and forming a final image substantially clear of the aberrations. Other systems may employ an encoder that codes wavefronts of acoustical waves propagating through a medium to make the wavefronts substantially invariant to acoustical aberrations from the medium. Imaging and decoding of the wavefronts reverse effects of the wavefront coding and produce sounds substantially free of the aberrations.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: August 21, 2007
    Assignee: CDM Optics, Inc.
    Inventors: Edward Raymond Dowski, Jr., Kenneth Scott Kubala, Alan Eugene Baron
  • Patent number: 7180673
    Abstract: An optical system with mechanical adjustment provides for the rotation and/or translation of one or more optical phase filters to variably select an extended depth of field, aberration-tolerance, and/or anti-aliasing properties of an optical imaging system. By adjusting the amount of phase induced on the wavefront, a user may select image quality selectively. The system may further automatically counter change of focus and/or aperture to maintain substantially constant image properties. Typically, two phase filters are used and moved concurrently to achieve desired image properties.
    Type: Grant
    Filed: March 25, 2004
    Date of Patent: February 20, 2007
    Assignee: CDM Optics, Inc.
    Inventor: Edward Raymond Dowski, Jr.
  • Patent number: 7089835
    Abstract: A method and control system for forming workpiece surfaces with at least a portion being non-rotationally symmetric (i.e., axis asymmetric) is provided. In one aspect, a slow tool servo system is provided to fabricate a surface having at least an axis asymmetric portion, and optionally, a superimposed axis symmetric asphere or spherical portion. A workpiece is mounted on a spindle and a tool is mounted to a translatable tabletop surface. The z position of the contact point of the workpiece and working tool is determined as a function of the x position of the same contact point and as a function of the angle of rotation of the spindle about the spindle axis. By making the z position of the contact point a function of both the angle of spindle rotation and the x position, the lateral and longitudinal position of the working tool can be moved at designated spindle rotation angles to form a surface having both axis asymmetric and axis symmetric asphere or spherical portions.
    Type: Grant
    Filed: July 2, 2003
    Date of Patent: August 15, 2006
    Assignee: CDM Optics, Inc.
    Inventor: James B. Bryan
  • Patent number: 7088419
    Abstract: An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.
    Type: Grant
    Filed: June 1, 2004
    Date of Patent: August 8, 2006
    Assignee: CDM Optics, Inc.
    Inventors: Edward Raymond Dowski, Jr., Gregory E. Johnson, Kenneth S. Kubala, Wade Thomas Cathey, Jr.
  • Patent number: 6842297
    Abstract: Improved Wavefront Coding Optics, which apply a phase profile to the wavefront of light from an object to be imaged, retain their insensitivity to focus related aberration, while increasing the heights of the resulting MTFs and reducing the noise in the final images. Such improved Wavefront Coding Optics have the characteristic that the central portion of the applied phase profile is essentially flat (or constant), while a peripheral region of the phase profile around the central region alternately has positive and negative phase regions relative to the central region.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: January 11, 2005
    Assignee: CDM Optics, Inc.
    Inventor: Edward Raymond Dowski, Jr.