Patents Assigned to Central Class Co., Ltd.
  • Sulfonamide-containing topcoat and photoresist additive compositions and methods of use
    Patent number: 9422445
    Abstract: Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: August 23, 2016
    Assignees: International Business Machines Corporation, Central Class Co., Ltd.
    Inventors: Daniel Paul Sanders, Masaki Fujiwara, Yoshiharu Terui