Abstract: A modular pod may include two or more walls, a roof, and a base, an air plenum, an air inlet, and an air economizer. The two or more walls, the roof, and the base may define a substantially enclosed interior space. The return air plenum may be positioned within the interior space. The air inlet may be positioned proximate one of the walls. The air economizer may be positioned within the interior space. The air economizer may include a mixing zone and two or more air shafts. The mixing zone may be in communication with the air inlet. The two or more air shafts may be in communication with the air plenum and in communication with the mixing zone. Each air shaft may taper down from the top end to the bottom end of the air shaft.
Type:
Grant
Filed:
March 15, 2013
Date of Patent:
July 18, 2017
Assignee:
CH2M Hill Engineers, Inc.
Inventors:
Benjamin D. Rasmussen, Robert Kirkendall, Michael R. Monis, Aubrey A. Berliner, III, Judson W. Moore, Dale W. Heberling, Keith L. Kibbee, David W. Seger, Timothy G. Meier
Abstract: A system for supplying chlorine to and recovering chlorine from a polysilicon plant may include a brine treatment system, at least one membrane cell, a chlorine drying system, a chlorine compression system, a hydrogen drying system, a hydrogen compression system, a hydrogen chloride synthesis/desorption system, a hydrogen chloride liquefaction system, a liquefied hydrogen chloride storage system, a hydrogen chloride vaporizer, and a waste conversion and filtration system. These systems may be operatively joined to generate hydrogen chloride gas for delivery to the polysilicon plant. A method for supplying chlorine to the polysilicon plant may include generating hydrogen gas and chlorine gas from recovered and raw salt, converting at least a portion of the hydrogen gas and at least a portion of the chlorine gas to hydrogen chloride, passing the hydrogen chloride through a cryogenic column, vaporizing the hydrogen chloride, and providing the vaporized hydrogen chloride to the polysilicon plant.
Abstract: Systems and methods for treating hazardous materials are disclosed. One exemplary implementation provides a system for rendering chemical weapons materiel less hazardous. This system includes a detonation chamber, an expansion chamber, and an emission treater adapted to treat gas from detonation of the chemical weapons materiel. The emission treater yields a substantially dry residual waste stream and a treated gas suitable for venting to atmosphere. The emission treater may treat the gas with an alkaline powder that interacts with the gas, producing the residual waste stream.
Type:
Grant
Filed:
June 6, 2007
Date of Patent:
April 20, 2010
Assignees:
CH2M Hill Constructors, Inc., CH2M Demilitarization, Inc., CH2M Hill Engineers, Inc.
Inventors:
Jay M. Quimby, Richard A. Johnson, Alan T. Edwards, John L. Donovan, McRea B. Willmert
Abstract: A system for supplying chlorine to and recovering chlorine from a polysilicon plant may include a brine treatment system, at least one membrane cell, a chlorine drying system, a chlorine compression system, a hydrogen drying system, a hydrogen compression system, a hydrogen chloride synthesis/desorption system, a hydrogen chloride liquefaction system, a liquefied hydrogen chloride storage system, a hydrogen chloride vaporizer, and a waste conversion and filtration system. These systems may be operatively joined to generate hydrogen chloride gas for delivery to the polysilicon plant. A method for supplying chlorine to the polysilicon plant may include generating hydrogen gas and chlorine gas from recovered and raw salt, converting at least a portion of the hydrogen gas and at least a portion of the chlorine gas to hydrogen chloride, passing the hydrogen chloride through a cryogenic column, vaporizing the hydrogen chloride, and providing the vaporized hydrogen chloride to the polysilicon plant.