Patents Assigned to Chartered Semiconductor Manuf. Ltd.
  • Double polishing head
    Patent number: 6155913
    Abstract: Double or multiple unit polishing heads are used thereby negating the negative effects that irregularities in the surface of the polishing pad have on the polishing results obtained. Adjacent double or multiple unit polishing heads rotate in opposite directions thereby eliminating the effects of microscopic directions in the surface of the polishing pads.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: December 5, 2000
    Assignees: Chartered Semiconductor Manuf. Ltd., Silicon Manufacturing Partners, Pte, Ltd.
    Inventor: Ser Wee Quek