Patents Assigned to Cheil Industries Inc.
  • Patent number: 9612378
    Abstract: A folder type polarizing film for OLEDs and a display device, the film including a polarizer; a transparent support attached to an upper surface of the polarizer, the transparent support being a cycloolefin polymer film; and a compensation film attached to a lower surface of the polarizer, the compensation film being a cycloolefin polymer having a phase difference of ?/4 relative to a polarization axis of the polarizer.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: April 4, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Seon Oh Hwang, Yong Woon Kim, Hae Ryong Chung
  • Patent number: 9606265
    Abstract: An adhesive composition for polarizing plates, a polarizing plate using the same, and an optical member including the same, the adhesive composition including an epoxy compound, a (meth)acrylic compound, and a polyfunctional thiol compound.
    Type: Grant
    Filed: June 29, 2013
    Date of Patent: March 28, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Tae Hyun Lee, Ik Hwan Cho, Mi Yeon Yu, Do Heon Lee, In Cheon Han
  • Patent number: 9606438
    Abstract: Disclosed is a resist underlayer composition including a compound including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A1 to A3, X1, X2, L1, L2, Z, and m are the same as defined in the specification.
    Type: Grant
    Filed: November 5, 2013
    Date of Patent: March 28, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Min-Gyum Kim, Hyo-Young Kwon, Jun-Ho Lee, Hwan-Sung Cheon
  • Patent number: 9598582
    Abstract: The present invention relates to an encapsulating composition, a barrier layer including the same, and an encapsulated apparatus including the same, and the composition comprises (A) a photocurable monomer and (B) a photocurable monomer containing a carboxylic acid group, wherein (B) the photocurable monomer containing the carboxylic acid group has an amide bond.
    Type: Grant
    Filed: July 31, 2013
    Date of Patent: March 21, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Seong Ryong Nam, Ji Hye Kwon, Yeon Soo Lee, Ji Yeon Lee, Chang Min Lee, Min Haeng Cho, Seung Jib Choi, Kyoung Jin Ha
  • Patent number: 9599898
    Abstract: A black photosensitive resin composition includes (A) pigment dispersion including at least two kinds of carbon black having different oil absorption from each other; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent. A light-blocking layer can be formed using the same.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: March 21, 2017
    Assignee: Cheil Industries Inc.
    Inventors: Ho-Jeong Paek, Do-Uk Kim, Min-Sung Kim, Lee-June Kim, Jin-Woo Park, Young-Tai Lee, Young-Woong Jang, Seung-Jib Choi
  • Patent number: 9598612
    Abstract: An adhesive composition and an optical member using the same, the adhesive composition including an acrylic resin; an isocyanate cross-linking agent; and a carbodiimide cross-linking agent, wherein the adhesive composition exhibits a creeping distance of about 100 ?m or less when the composition attached to a glass substrate with a bonding area of about 1.5 cm×1.5 cm is left at about 22° C. and about 50% RH for about 3 days and is subjected to a load of about 10 gf/mm2 for about 1,000 seconds, and a storage modulus of about 1×105 to about 1×107 Pa at about 10 Hz and about 30° C. under conditions in which a sample has a thickness of about 1 mm and an elongation of about 10%.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: March 21, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Hee Yeon Ki, Woo Jin Jeong
  • Patent number: 9593268
    Abstract: An adhesive composition and a polarizing plate, the adhesive composition including an isocyanate curing agent and having a creeping distance decrease rate of 10% or less, wherein the creeping distance decrease rate is calculated by Equation 1: Creeping distance decrease rate (%)=|(A?B)/A|×100,??[Equation 1] wherein, in Equation 1, A and B are creeping distances of an adhesive layer prepared from the composition, when a force of 2.25 kg is applied to a polarizing plate at 25° C. for 1,000 seconds after the polarizing plate formed with the adhesive layer is attached to a glass plate and left at 35° C. and 45% RH for 24 hours and for 36 hours, respectively.
    Type: Grant
    Filed: June 29, 2013
    Date of Patent: March 14, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Won Kim, Eun Hwan Jeong, Yi Eun Kim
  • Patent number: 9593260
    Abstract: The present invention relates to a CMP slurry composition for polishing copper, comprising: polishing particles; a complexing agent; a corrosion inhibitor; and deionized water. The complexing agent comprises one or more organic acids selected from oxalic acid, malic acid, malonic acid, and formic acid, and glycine.
    Type: Grant
    Filed: June 21, 2013
    Date of Patent: March 14, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Jong Il Noh, Dong Hun Kang, Tae Wan Kim, Jeong Hwan Jeong, Young Nam Choi, Chang Ki Hong
  • Patent number: 9595677
    Abstract: A material for an organic photoelectric device includes a compound represented by the following Formula 1:
    Type: Grant
    Filed: November 15, 2012
    Date of Patent: March 14, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Nam-Soo Kim, Eun-Sun Yu, Ja-Hyun Kim, Mi-Young Chae
  • Patent number: 9590210
    Abstract: A method of evaluating an image blur of an optical film includes displaying a test pattern by driving an organic light-emitting display apparatus including the optical film, obtaining an image by capturing the test pattern using a digital camera, obtaining a spatial luminance distribution from the image, transforming the spatial luminance distribution into a sensation curve, and estimating a blur width from the sensation curve, where the blur width is a distance between peaks having negative minimum values, from among a plurality of peaks of the sensation curve.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: March 7, 2017
    Assignees: SAMSUNG ELECTRONICS CO., LTD, CORNING PRECISION MATERIALS CO., LTD., CHEIL INDUSTRIES INC.
    Inventors: Hyunmin Kim, Youmin Shin, Hongshik Shim, Young Oh, Chulho Jeong, Eunyoung Cho
  • Patent number: 9587046
    Abstract: Disclosed are a photocurable composition which includes (A) a photocurable monomer and (B) a monomer represented by Formula 1, and an apparatus including a protective layers formed of the composition;
    Type: Grant
    Filed: June 12, 2013
    Date of Patent: March 7, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Chang Min Lee, Seung Jib Choi, Ji Hye Kwon, Kyoung Jin Ha, Yeon Soo Lee
  • Patent number: 9589696
    Abstract: A semiconductor device bonded by an anisotropic conductive adhesive composition, the anisotropic conductive adhesive composition having a solid content ratio between a polymer binder system and a curing system of about 40:60 to about 60:40, and a coefficient of thermal expansion of about 150 ppm/° C. or less at about 100° C. or less.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: March 7, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun Hee Namkung, Jae Sun Han, Hyun Wook Kim, Jin Young Seo, Kwang Jin Jung, Dong Seon Uh
  • Patent number: 9575217
    Abstract: Optical films, and organic light-emitting display devices employing the same, include a high refractive index pattern layer including a lens pattern region and a non-pattern region alternately formed, wherein the lens pattern region includes a plurality of grooves each having a depth larger than a width thereof, and the non-pattern region has no pattern; and a low refractive index pattern layer formed of a material having a refractive index smaller than a refractive index of the high refractive index pattern layer, wherein the low refractive index pattern includes a plurality of filling portions filling the plurality of grooves.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: February 21, 2017
    Assignees: Samsung Electronics Co., Ltd., Cheil Industries, Inc.
    Inventors: Hong-shik Shim, Eun-young Cho, Hyun-min Kim, You-min Shin, Young Oh, Chul-ho Jeong
  • Patent number: 9574108
    Abstract: A composition for forming a silica-based insulation layer, a silica-based insulation layer, and a method of manufacturing the silica-based insulation layer, the composition including a solvent; and an organosilane-based condensation polymerization product that includes a structural unit represented by the following Chemical Formula 1:
    Type: Grant
    Filed: April 23, 2014
    Date of Patent: February 21, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Eun-Su Park, Taek-Soo Kwak, Yoong-Hee Na, Hyun-Ji Song, Han-Song Lee, Seung-Hee Hong
  • Patent number: 9562991
    Abstract: Disclosed is a polymer comprising a repeating unit represented by Chemical Formula 1, or a polymer comprising a repeating unit represented by Chemical Formula 2: wherein R1, R2, x and y are as defined herein.
    Type: Grant
    Filed: August 8, 2013
    Date of Patent: February 7, 2017
    Assignees: SAMSUNG ELECTRONICS CO., LTD., CHEIL INDUSTRIES INC.
    Inventors: Hyung Jun Kim, Kyoung Ah Oh, Eun Kyung Lee, Kyu Yeol In, Myung Sup Jung, Won-Cheol Jung
  • Patent number: 9562123
    Abstract: The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: February 7, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Chang Min Lee, Seung Jib Choi, Ji Hye Kwon, Yeon Soo Lee, Kyoung Jin Ha
  • Patent number: 9556094
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: January 31, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi
  • Patent number: 9559309
    Abstract: A compound for an organic optoelectronic device, an organic light emitting diode including the same, and a display device including the organic light emitting diode are disclosed, the compound being represented by the following Chemical Formula 1:
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: January 31, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Soo-Hyun Min, Eun-Sun Yu, Hyung-Sun Kim, Mi-Young Chae
  • Patent number: 9551812
    Abstract: An adhesive composition, an adhesive layer, an optical member, and an adhesive sheet, the adhesive composition including 100 parts by weight of a (meth)acrylic copolymer, the (meth)acrylic copolymer having a weight average molecular weight of about 100,000 to about 2,000,000 g/mol; about 0.05 to about 5 parts by weight of a carbodiimide crosslinker; and about 0.01 to about 0.3 parts by weight of an organic group-containing compound, the organic group-containing compound including at least one selected from the group of titanium, zirconium, and hafnium.
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: January 24, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hirosh Ogawa, Tatsuhiro Suwa
  • Patent number: 9548460
    Abstract: A compound for an organic optoelectronic device is represented by Chemical Formula 1: and, in Chemical Formula 1, one of Ar1 or Ar2 is a substituted or unsubstituted C6 to C30 aryl group, or a substituted or unsubstituted C3 to C30 heteroaryl group, and the other of Ar1 or Ar2 is a substituent represented by the Chemical Formula 2:
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: January 17, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Ho-Kuk Jung, Dong-Min Kang, Myeong-Soon Kang, Eui-Su Kang, Nam-Soo Kim, Nam-Heon Lee, Mi-Young Chae