Patents Assigned to Cheil Industries
  • Compound for organic optoelectronic device, organic light emitting diode including the same, and display including the organic light emitting diode
    Patent number: 9406891
    Abstract: Disclosed are a compound for an organic optoelectronic device, an organic light emitting diode including the same, and a display device including the organic light emitting diode. A compound for an organic optoelectronic device represented by Chemical Formula 1 provides an organic optoelectronic device having an excellent life-span and improved luminous efficiency at a low driving voltage due to excellent electrochemical and thermal stability.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: August 2, 2016
    Assignees: SAMSUNG ELECTRONICS CO., LTD., CHEIL INDUSTRIES INC.
    Inventors: Yong Sik Jung, Ho Suk Kang, Hyeon Ho Choi, Sang Mo Kim, Jhun Mo Son, Kyu Young Hwang
  • Thermoplastic resin composition and molded article using the same
    Patent number: 9403978
    Abstract: A thermoplastic resin composition comprises (A) about 30 to about 98 wt % of a polycarbonate resin, (B) about 1 to about 50 wt % of a rubber modified acrylic-based graft copolymer, and (C) about 1 to about 69 wt % of a branched copolymer including silicon-based compound. A molded article can be made using the same.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: August 2, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Kee-Hae Kwon, In-Chol Kim, Bo-Eun Kim, Joo-Hyun Jang, Chang-Min Hong
  • Acrylic adhesive composition and polarizer film using the same
    Patent number: 9404024
    Abstract: An adhesive composition includes an acrylic copolymer having at least one alkyl group, at least one hydroxyl group, and at least one furyl based group; and a curing agent.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: August 2, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Kyoung Jin Ha, Irina Nam, Lee Jun Kim, Kil Sung Lee, Eun Hwan Jeong, Woo Jin Jeong
  • Polyamide composition having surface reflectance and heat resistance
    Patent number: 9403980
    Abstract: A polyamide resin composition includes (A) a polyamide resin in an amount of about 30 to about 80% by weight, (B) inorganic filler in an amount of about 10 to about 60% by weight, (C) white pigment in an amount of about 5 to about 50% by weight; and (D) photostabilizer in an amount of about 0.05 to about 2 parts by weight and (E) inorganic fine particles in an amount of about 0.05 to about 3 parts by weight, wherein each of (D) and (E) is based on about 100 parts by weight of the polyamide resin (A). The polyamide resin composition can have good light reflectance and yellowing resistance.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: August 2, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Sang Hwa Lee, Jong Cheol Lim, In Sik Sim, Pil Ho Kim
  • Separator including coating layer of inorganic and organic mixture, and battery including the same
    Patent number: 9401505
    Abstract: A polyolefin porous separator includes a polyolefin porous base film, and a coating layer formed on one or both sides of the base film. The coating layer includes inorganic particles. The inorganic particles include first inorganic particles having an average particle size ranging from 150 nm to 600 nm, and second inorganic particles having an average particle size ranging from 5 nm to 90 nm. The separator has a thermal conductivity of 0.3 W/m·K or more.
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: July 26, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Ki Chul Hong, Myung Kook Park, Jae Goo Doh, Jun Ho Chung, Geon Ja Lim
  • Polycarbonate resin, production method for same, and molded article comprising same
    Patent number: 9394403
    Abstract: The polycarbonate resin of the present invention comprises: a repeating unit represented by formula 1 of claim 1; and a repeating unit represented by formula 2 of claim 1. The polycarbonate resin has excellent scratch resistance, transparency and tensile elongation.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: July 19, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Jong Chan Hur, O Sung Kwon, Il Hwan Yang, Dong Geun Lee, Bok Nam Jang, Jun Ho Chi, Woo Suk Chei
  • Optical member comprising anisotropic conductive film
    Patent number: 9389338
    Abstract: An optical member includes an anisotropic conductive film that has a multilayer structure having a bonding layer containing an epoxy resin as a curing part and a bonding layer containing a (meth)acrylate resin as a curing part.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: July 12, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Dong Seon Uh, Hyun Hee Namkung, Kwang Jin Jung, Jin Seong Park, Jae Sun Han
  • Electronic device using anisotropic conductive composition and film
    Patent number: 9390831
    Abstract: An electronic device includes a connection material formed from an adhesive composition that includes: a polymer resin; a cationic polymerization catalyst represented by Formula 1; and an organic base, where, in Formula 1, R1 may be selected from the group of hydrogen, C1-C6 alkyl, C6-C14 aryl, —C(?O)R4, —C(?O)OR5, and —C(?O)NHR6 (in which R4, R5, and R6 may each independently be selected from C1-C6 alkyl and C6-C14 aryl), R2 may be C1-C6 alkyl, and R3 may be selected from the group of a nitrobenzyl group, a dinitrobenzyl group, a trinitrobenzyl group, a benzyl group, a C1-C6 alkyl-substituted benzyl group, and a naphthylmethyl group.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: July 12, 2016
    Assignee: CHEIL INDUSTRIES INC.
    Inventors: Kyoung Soo Park, Nam Ju Kim, Young Woo Park, Joon Mo Seo, Kyung Il Sul, Dong Seon Uh, Arum Yu, Hyun Min Choi, Jae Sun Han
  • Photosensitive resin composition for color filter and color filter using the same
    Patent number: 9389502
    Abstract: Disclosed are a photosensitive resin composition for a color filter that includes (A) a colorant including a cyanine dye represented by the following Chemical Formula 1, (B) an acrylic-based binder resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a color filter using the same. In the above Chemical Formula 1, each substituent is the same as described in the detailed description.
    Type: Grant
    Filed: July 16, 2013
    Date of Patent: July 12, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Young Jeong, Dong-Wan Kim, Ji-Hong Kim, Jee-Hyun Ryu, In-Jae Lee, Gyu-Seok Han
  • Transparent conductor, composition for preparing the same, and optical display apparatus including the same
    Patent number: 9384865
    Abstract: A transparent conductor, a composition for the same, and an apparatus including the same, the transparent conductor including a transparent conductive film, the transparent conductive film including a metal nanowire and a conductive polymer, wherein the transparent conductor has a b* value of less than about 1.78 in color coordinates of CIE Lab at wavelengths of 400 nm to 700 nm.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: July 5, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Do Young Kim, Young Kwon Koo, Dong Myeong Shin, Oh Hyeon Hwang, Kyoung Ku Kang
  • Anisotropic conductive film, composition for the same, and apparatus including the same
    Patent number: 9384869
    Abstract: An anisotropic conductive film includes a binder part, a curing part, an initiator, and conductive particles, wherein the binder part includes at least one of a nitrile butadiene rubber (NBR) resin and a urethane resin, wherein the anisotropic conductive film has an electrical conductivity of more than 0 ?S/cm to about 100 ?S/cm.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: July 5, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Youn Jo Ko, Dong Seon Uh, Jang Hyun Cho, Jin Seong Park, Sang Sik Bae, Jin Kyu Kim
  • Adhesive film, adhesive composition for the same, and optical member including the same
    Patent number: 9382457
    Abstract: An adhesive film, an adhesive composition for the same, and an optical member including the same, the adhesive film having an index of refraction of about 1.48 or more and a dielectric constant variation of about 30% or less, as expressed by Equation 1: Dielectric ? ? constant ? ? variation ? ? ( % ) = ( A - B ) A × 100 , [ Equation ? ? 1 ] wherein A is the dielectric constant of the adhesive film measured at a frequency of 103 Hz, and B is the dielectric constant of the adhesive film measured at a frequency of 106 Hz, and/or the adhesive film including a (meth)acrylate copolymer having carbonate groups and an aromatic groups.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: July 5, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Lee June Kim, Ik Hwan Cho, Ki Yong Kim, Sung Hyun Mun, In Cheon Han
  • Rubber-modified vinyl-based graft copolymer, and thermoplastic resin composition including the same
    Patent number: 9382369
    Abstract: The present invention relates to a rubber-modified vinyl-based graft copolymer to which acrylic monomers containing a phenyl or phenoxy group are grafted in order to increase compatibility with a polycarbonate resin, and also relates to a thermoplastic resin composition including the rubber-modified vinyl-based graft copolymer. The thermoplastic resin composition according to the present invention can significantly improve appearance and high fluidity and can have high flowability and chemical resistance.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: July 5, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ki Bo Chang, Jun Hwan Ahn, Sung Il Myung
  • Polarizing plate and liquid crystal display including the same
    Patent number: 9383494
    Abstract: A polarizing plate includes a polarizer and at least one protective film on at least one side of the polarizer. The protective film has an in-plane retardation (Re) of greater than about 10,000 nm at a wavelength of 550 nm, as calculated by Re=(nx?ny)×d, wherein nx and ny are indexes of refraction in x-axis and y-axis directions of the protective film, respectively, and d is a thickness of the protective film.
    Type: Grant
    Filed: December 17, 2012
    Date of Patent: July 5, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Kwang Ho Shin, Dong Yoon Shin, Eun Su Park, Hae Ryong Chung, Eun Kyeong Seo
  • Method for manufacturing a film laminate, and film laminate formed by the method
    Patent number: 9375906
    Abstract: The present invention relates to a method for manufacturing a film laminate and to a film laminated formed by the method. The method comprises the steps of: applying a photocurable composition to a first base film; and irradiating light from a UV LED in order to harden the photocurable composition, wherein the first base film has a transmittance of approximately 50% or higher at the emission wavelength of the UV LED.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: June 28, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Jin Ki Hong, Seong Heun Cho, Kyoung Ku Kang, Hyoung Tae Im, Jung Hyo Lee, Si Kyun Park, Se Hyun Park
  • Crystalline polyamide ester resin, method for preparing the same, and article including the same
    Patent number: 9371421
    Abstract: A crystalline polyamide ester resin is prepared by copolymerizing (A) a dicarboxylic acid component, (B) a diamine component, and (C) a cyclic aliphatic diol component, and has a structure in which a dicarboxylic acid moiety derived from the dicarboxylic acid component (A), a diamine moiety derived from the diamine component (B) and a cyclic aliphatic diol moiety derived from the cyclic aliphatic diol component (C) are repeated. A molar ratio ((B):(C)) of the diamine component (B) to the cyclic aliphatic diol component (C) is about 80 to about 99:about 1 to about 20. The crystalline polyamide ester resin has a melting point (Tm) ranging from about 280° C. to about 320° C. and a crystallization temperature (Tc) ranging from about 260° C. to about 290° C. The crystalline polyamide ester resin can have excellent heat resistance, discoloration resistance and moldability.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: June 21, 2016
    Assignee: Cheil Industries Inc.
    Inventors: So Young Kwon, Jin Kyu Kim, Seung Youb Bang, Sang Kyun Im, Jin A Je, Ki Yon Lee, Suk Min Jun, Sung Chul Choi
  • Resin compositions and articles including the same
    Patent number: 9359500
    Abstract: Disclosed is a resin composition including (A) a polycarbonate resin and (B) a rubber modified vinyl-based graft copolymer, and (C) about 1 to about 9 parts by weight of a random copolymer of a compound represented by the following Chemical Formula 1, an aromatic vinyl monomer, and a vinyl cyanide monomer, based on about 100 parts by weight of the polycarbonate resin (A) and the rubber-modified vinyl-based graft copolymer (B): wherein, in the above chemical formula, m is an integer ranging from 0 to 10, and X is phenyl, methylphenyl, methylethylphenyl, methoxyphenyl, cyclohexylphenyl, chlorophenyl, bromophenyl, phenylphenyl group, or benzylphenyl.
    Type: Grant
    Filed: December 27, 2013
    Date of Patent: June 7, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Jung-Eun Park, Kee-Hae Kwon, Jin-Young Huh, Chang-Min Hong
  • Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer
    Patent number: 9362030
    Abstract: A composition for forming a silica-based insulation layer, a silica-based insulation layer, and a method of manufacturing the silica-based insulation layer, the composition including a solvent; and an organosilane-based condensation polymerization product, the organosilane-based condensation polymerization product being prepared from a compound mixture, the compound mixture including compounds represented by the following Chemical Formulae 1 and 2: (R1)3SiXSi(R1)3??[Chemical Formula 1] R2e(Si)OR34-e.
    Type: Grant
    Filed: May 2, 2014
    Date of Patent: June 7, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Eun-Su Park, Taek-Soo Kwak, Yoong-Hee Na, Hyun-Ji Song, Han-Song Lee, Seung-Hee Hong
  • Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
    Patent number: 9359276
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
    Type: Grant
    Filed: November 21, 2012
    Date of Patent: June 7, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Yoo-Jeong Choi, Hyo-Young Kwon, Youn-Jin Cho, Yun-Jun Kim, Young-Min Kim, Yong-Woon Yoon, Chung-Heon Lee
  • Polyamide resin, preparation method therefor, and molded product including same
    Patent number: 9359476
    Abstract: The polyamide resin of the present invention is a polyamide resin containing an amine group and a carboxyl group, wherein the amine group concentration is about 200 to 300 ?eq/g and two to six times as high as the carboxyl group concentration. The polyamide resin has excellent long-thermal stability.
    Type: Grant
    Filed: March 27, 2013
    Date of Patent: June 7, 2016
    Assignee: Cheil Industries Inc.
    Inventors: So Young Kwon, Jin Kyu Kim, Seung Youb Bang, Eun Ju Lee, Sang Kyun Im, Ki Yon Lee, Suk Min Jun, Sung Chul Choi