Abstract: The present invention provides a transparent thermoplastic resin composition which may comprise (A) about 1 to about 100 parts by weight of an ultra-high molecular weight branched acrylic copolymer resin; (B) about 0 to about 99 parts by weight of an acrylic resin; and (C) about 0 to about 40 parts by weight of an acrylic impact modifier, based on 100 parts by weight of (A) and (B). The ultra-high molecular branched acrylic copolymer resin (A) may be prepared by polymerizing a monomer mixture comprising (a1) about 50 to about 99.899% by weight of a mono-functional monomer, (a2) about 0.1 to about 40% by weight of a (meth)acrylic monomer having a flexible segment represented following Chemical Formula 1, and (a3) about 0.001 to about 10% by weight of a branch-inducing monomer. The thermoplastic resin composition of the present invention can have improved transparency, scratch resistance, flowability, and impact strength.
Type:
Grant
Filed:
December 21, 2010
Date of Patent:
October 16, 2012
Assignee:
Cheil Industries Inc.
Inventors:
Kee Hae Kwon, Jin Hwa Chung, Kwang Soo Park, Dong Kil Choi, Il Jin Kim
Abstract: Artificial marble having a transparent amorphous pattern includes a base or matrix material portion and a transparent pattern portion. The pattern portion has a specific gravity or about 1.60 or more and is formed by hardening or curing a resin composition comprising a binder selected from halogenated urethane acrylates, halogenated epoxy acrylates and combinations thereof and an acrylic polymerizable monomer.
Type:
Application
Filed:
June 22, 2012
Publication date:
October 11, 2012
Applicant:
CHEIL INDUSTRIES INC.
Inventors:
Dong Hee KIM, Eung Seo PARK, Chang Ho SON
Abstract: The present invention provides a thermoplastic resin composition that can have excellent flame retardancy comprising about 100 parts by weight of a base resin including about 30 to about 100% by weight of a polycarbonate-based resin (A); and about 0.1 to about 40 parts by weight of a phosphorus-containing compound in the form of polymer (C). The thermoplastic resin composition can have excellent flame retardancy, can exhibit a balance of properties such as impact strength, heat resistance, flowability, and the like, and can be environment-friendly.
Type:
Application
Filed:
June 18, 2012
Publication date:
October 11, 2012
Applicant:
CHEIL INDUSTRIES INC.
Inventors:
Chang Hong Ko, Seon Ae Lee, Beom Jun Joo, Im Hyuck Bae, Won Gi Lee
Abstract: Disclosed is an organic compound that easily dissolves in an organic solvent, and that is applicable as a host material of an emission layer of an organic photoelectric device since it emits fluorescence and phosphorescence at a red wavelength through a blue wavelength. The organic compound according to one embodiment of the present invention is represented by Chemical Formula 1. In the above Chemical Formula 1, X1 to X24, Ar1 to Ar3, and Ar? to Ar??, and Chemical Formulae 2 to 5, are as described in the specification. The organic compound easily dissolves in an organic solvent, and is applicable as a host material of an emission layer of an organic photoelectric device since it emits fluorescence and phosphorescence at a red wavelength through a blue wavelength.
Abstract: A triphenylmethane-based complex dye, a photosensitive resin composition, and a color filter, the triphenylmethane-based complex dye being represented by the following Chemical Formula 1:
Type:
Grant
Filed:
June 23, 2011
Date of Patent:
October 9, 2012
Assignee:
Cheil Industries, Inc.
Inventors:
Nam-Gwang Kim, Jianhua Li, Sina Maghsoodi, Shahrokh Motallebi, Jae-Hyun Kim, Gyu-Seok Han
Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
Type:
Grant
Filed:
August 1, 2011
Date of Patent:
October 2, 2012
Assignee:
Cheil Industries Inc.
Inventors:
Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Seong-Yong Uhm, Sang-Won Cho
Abstract: An optical laminate film, a backlight unit, and a liquid crystal display module, the optical laminate film including a multilayer film composed of multiple layers including at least two polymers having different refractive indexes, the multilayer film transmitting only a light component vibrating in a direction parallel to one transmittance axis while reflecting other light components; an embossed diffusing film laminated on one side of the multilayer film, the embossed diffusing film having roughness on a surface thereof; and a microlens film laminated on another side of the multilayer film, the microlens film having microlenses arranged on a surface thereof.
Type:
Grant
Filed:
November 15, 2010
Date of Patent:
October 2, 2012
Assignee:
Cheil Industries, Inc.
Inventors:
Jin Woo Lee, Gyu Chan Cho, Sun Hong Park, Sei Jin Oh
Abstract: A diffuser prism sheet, an LCD back light unit including the same, and an LCD device including the same, the diffuser prism sheet including a base film made of a transparent material, and a light refracting part on a surface of the base film, the light refracting part including a plurality of unit prisms arranged in one direction, having a predetermined cross-sectional shape and valley regions between adjacent unit prisms, and light diffusing elements in the valley regions between the adjacent unit prisms.
Type:
Grant
Filed:
September 14, 2009
Date of Patent:
September 25, 2012
Assignee:
Cheil Industries, Inc.
Inventors:
Jun Hyeak Choi, Man Suk Kim, Ju Yeol Choi, Seok Hoon Jang
Abstract: A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y??(A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.
Type:
Grant
Filed:
November 21, 2007
Date of Patent:
September 25, 2012
Assignee:
Cheil Industries, Inc.
Inventors:
Mi Young Kim, Sang Kyun Kim, Sang Hak Lim, Sang Ran Koh, Hui Chan Yun, Do Hyeon Kim, Dong Seon Uh, Jong Seob Kim
Abstract: Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.
Type:
Grant
Filed:
June 16, 2011
Date of Patent:
September 25, 2012
Assignee:
Cheil Industries Inc.
Inventors:
Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Jung-Sik Choi
Abstract: Disclosed herein is a method for evaluating scratch resistance of a plastic resin comprising scratching a surface of a test sample of plastic resin using a scratch apparatus to form a scratch of the surface having a scratch profile; scanning the scratched test sample with a surface profile analysis apparatus to measure the scratch profile; and creating a scratch resistance evaluation index based on the measured scratch profile to evaluate the scratch resistance of the test sample. The method has good reliability and reproducibility, reduces measurement time and errors caused by measurers and measuring conditions, provides easy measurement and can be widely applied to all plastic resins.
Type:
Grant
Filed:
June 5, 2009
Date of Patent:
September 18, 2012
Assignee:
Cheil Industries Inc.
Inventors:
Kee Hae Kwon, Il Jin Kim, Hyung Rang Moon, Jae Bum Park, Seong Ho Kong, O Sung Kwon
Abstract: Provided are an environmentally-friendly polyamide resin composition that includes (A-1) a first polyamide resin including polyamide 11, polyamide 1010, or a combination thereof, (B) a glass fiber having a cross-sectional aspect ratio of about 1.5 or more, and (C) a branched graft copolymer including a polyolefin main chain, and optionally (A-2) second polyamide resin including a C6 organic chain in one repeating unit, and a molded product using the same.
Abstract: A polymer composite material includes metal (oxide) nanoparticles chemically bonded to a vinyl polymer. Some embodiments may additionally comprise thermoplastic resin through which the nanoparticles and vinyl polymer are dispersed. In some embodiments, the composite materials have improved impact strength, tensile strength, heat resistance, and flexural modulus.
Abstract: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
Type:
Grant
Filed:
December 29, 2010
Date of Patent:
September 11, 2012
Assignee:
Cheil Industries, Inc.
Inventors:
Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
Abstract: The present invention relates to a photosensitive resin composition for a color filter and a color filter fabricated using the same. The photosensitive resin composition includes (a) an acrylic-based resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, (d) a pigment, and (e) a solvent. The acrylic-based resin is a copolymer including a repeating unit of an ethylenic unsaturated monomer including a carboxyl group and a repeating unit of an ethylenic unsaturated monomer including an alkoxy 4-oxo butanoic acid group. The photosensitive resin composition for a color filter can have residue removing characteristics, and is capable of forming fine pixels and providing a color filter having high resolution.
Type:
Grant
Filed:
March 4, 2010
Date of Patent:
September 11, 2012
Assignee:
Cheil Industries Inc.
Inventors:
Kil-Sung Lee, Jae-Hyun Kim, Chang-Min Lee, Eui-June Jeong
Abstract: An antiglare film includes a transparent substrate, and an antiglare layer on the transparent substrate, the antiglare layer including a light-transmitting coating layer and an antiglare agent contained in the light-transmitting coating layer, the antiglare agent being composed of first antiglare particles and second antiglare particles overlapping each other.
Abstract: Disclosed is a polyphenylene ether-based resin composition that includes (A) a base resin including (A-1) polyphenylene ether-based resin and (A-2) polyamide resin, (B) carbon nanotubes, (C) a styrene-based copolymer, and (D) an olefin-based copolymer.
Abstract: A material for an organic photoelectric device, the material including a compound including a pyridine moiety, the compound being a bipolar organic compound including both a hole transporting unit and an electron transporting unit, the compound being represented by the following Formula 1:
Type:
Grant
Filed:
October 13, 2009
Date of Patent:
August 21, 2012
Assignee:
Cheil Industries, Inc.
Inventors:
Eun-Sun Yu, Nam-Soo Kim, Young-Hoon Kim, Mi-Young Chae, Eui-Su Kang
Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.
Type:
Grant
Filed:
April 22, 2011
Date of Patent:
August 7, 2012
Assignee:
Cheil Industries, Inc.
Inventors:
Cheong Hun Song, Hiroshi Ogawa, Tatsuhiro Suwa