Patents Assigned to Chema Technology, Inc.
  • Patent number: 8758577
    Abstract: A system for electroplating a rotogravure cylinder out of a plating solution having a concentration of copper ions wherein the cylinder is connectable to a current source is provided. The system includes a plating apparatus configured to copper plate the cylinder comprising a non-dissolvable anode, a plating tank configured to receive the cylinder, a controller configured to control operation of the apparatus, and a tube for delivering a mixture of a hardener and the plating solution to the plating tank.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: June 24, 2014
    Assignee: Chema Technology, Inc.
    Inventor: Hubert F. Metzger
  • Publication number: 20130032484
    Abstract: A system for electroplating a rotogravure cylinder out of a plating solution having a concentration of copper ions wherein the cylinder is connectable to a current source is provided. The system includes a plating apparatus configured to copper plate the cylinder comprising a non-dissolvable anode, a plating tank configured to receive the cylinder, a controller configured to control operation of the apparatus, and a tube for delivering a mixture of a hardener and the plating solution to the plating tank.
    Type: Application
    Filed: October 12, 2012
    Publication date: February 7, 2013
    Applicant: Chema Technology, Inc.
    Inventor: Chema Technology, Inc.
  • Patent number: 8298395
    Abstract: An apparatus for electroplating a rotogravure cylinder out of a plating solution is disclosed. The apparatus includes a plating tank adapted to support the cylinder and to contain a plating solution so that the cylinder is at least partially disposed into the plating solution. The apparatus also includes a non-dissolvable anode at least partially disposed within the plating solution. A current source is electrically connected to the non-dissolvable anode and to the cylinder. An ultrasonic system may be provided to introduce wave energy into the plating solution includes at least one transducer element mountable within the tank and a power generator adapted to provide electrical energy to the transducer element. A holding tank having a circulation pump, a mixing system and heating and cooling elements for the plating solution may be provided.
    Type: Grant
    Filed: July 2, 2009
    Date of Patent: October 30, 2012
    Assignee: Chema Technology, Inc.
    Inventor: Hubert F. Metzger
  • Patent number: 7914658
    Abstract: An apparatus for electroplating a rotogravure cylinder out of a plating solution is disclosed. The apparatus includes a plating tank adapted to support the cylinder and to contain a plating solution so that the cylinder is at least partially disposed into the plating solution. The apparatus also includes a non-dissolvable anode at least partially disposed within the plating solution. A current source is electrically connected to the non-dissolvable anode and to the cylinder. An ultrasonic system may be provided to introduce wave energy into the plating solution includes at least one transducer element mountable within the tank and a power generator adapted to provide electrical energy to the transducer element. A holding tank having a circulation pump, a mixing system and heating and cooling elements for the plating solution may be provided.
    Type: Grant
    Filed: April 13, 2009
    Date of Patent: March 29, 2011
    Assignee: Chema Technology, Inc.
    Inventor: Hubert F. Metzger
  • Patent number: 6547936
    Abstract: An apparatus for electroplating and deplating an object out of a plating solution is disclosed. The apparatus includes a plating tank adapted to support the object and to contain a plating solution so that the object is at least partially disposed into the plating solution. The apparatus also includes a non-dissolvable conductor at least partially disposed within the plating solution. A current source is electrically connected to the non-dissolvable conductor and to the object. An ultrasonic system may be provided to introduce wave energy into the plating solution includes at least one transducer element mountable within the tank and a power generator adapted to provide electrical energy to the transducer element. A holding tank having a circulating pump and heating and cooling elements for the plating solution may be provided.
    Type: Grant
    Filed: March 20, 2000
    Date of Patent: April 15, 2003
    Assignee: Chema Technology, Inc.
    Inventor: Hubert F. Metzger