Patents Assigned to Chemical-Ways Corporation
  • Patent number: 4059929
    Abstract: A system for supplying an abrasive-containing liquid to a lapping or polishing machine includes a supply of abrasive slurry concentrate containing abrasive grain which is suspended in a liquid, a supply of diluent liquid which is essentially free from solids, and a mixing chamber positioned relatively close to a desired work surface. The slurry concentrate and diluent are separately conveyed under pressure to the mixing chamber to develop a diluted slurry concentrate which is sufficiently diluted to permit settling out of the abrasive grain. The diluted slurry is then supplied to the work surface.
    Type: Grant
    Filed: May 10, 1976
    Date of Patent: November 29, 1977
    Assignee: Chemical-Ways Corporation
    Inventor: David C. Bishop