Patents Assigned to Chemicals, Inc.
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Patent number: 7067179Abstract: A novel compound represented by the general formula (I), and a nematic liquid crystal composition incorporating the same. A compound represented by the general formula (I) can be produced industrially extremely easily, as shown in the examples, displays superior compatibility with current general purpose host liquid crystals as a nematic phase, and also shows little crystal precipitation at low temperatures. Moreover, by addition of a small amount of such a compound to a host liquid crystal, the liquid crystal temperature range at low temperatures can be effectively widened without any significant worsening of the various characteristics of the liquid crystal material. Consequently, a compound of the present invention is an extremely useful liquid crystal material which is suitable for various liquid crystal display elements which require a broad operating temperature range.Type: GrantFiled: September 10, 1999Date of Patent: June 27, 2006Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Shinji Ogawa, Tatsuo Kawara, Sadao Takehara, Hiroyuki Ohnishi, Kiyofumi Takeuchi, Haruyoshi Takatsu, Gerwald Grahe, Rainer Bruno Frings, Christine Fugger, Cornelia Pithart
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Patent number: 7064227Abstract: A composition selected from the group consisting of bis(tert-butoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof; its use to form a metal or metalloid silicate layer on a substrate and the synthesis of the mixed alkoxysilanols.Type: GrantFiled: December 9, 2004Date of Patent: June 20, 2006Assignee: Air Products and Chemicals, Inc.Inventors: Xinjian Lei, Ron Rulkens
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Patent number: 7064224Abstract: This invention is related to organometallic precursors and deposition processes for fabricating conformal metal containing films on substrates such as silicon, metal nitrides and other metal layers. The organometallic precursors are N,N?-alkyl-1,1-alkylsilylamino metal complexes represented by the formula: wherein M is a metal selected from Group VIIb, VIII, IX and X, and specific examples include cobalt, iron, nickel, manganese, ruthenium, zinc, copper, palladium, platinum, iridium, rhenium, osmium, and the R1-5 can be same or different selected from hydrogen, alkyl, alkoxy, fluoroalkyl and alkoxy, cycloaliphatic, and aryl.Type: GrantFiled: February 4, 2005Date of Patent: June 20, 2006Assignee: Air Products and Chemicals, Inc.Inventors: Xinjian Lei, Manchao Xiao, Hareesh Thridandam, Kirk Scott Cuthill
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Publication number: 20060127685Abstract: A polyimide metal laminate comprising a polyimide resin formed on a metal foil, wherein the polyimide resin does not cause the peeling of not less than 100 ?m in the polyimide resin and/or at an interface between the polyimide resin and the metal foil when the polyimide resin is heated in an oven at an atmospheric temperature of from 340 to 360° C. for 5 to 10 minutes, the coefficient of humidity expansion at 320 is from 1 to 20 ppm/% RH, and an average value of the etching rate by a 50 wt % aqueous solution of potassium hydroxide at 80° C. is not less than 1.0 ?m/min. The polyimide metal laminate can provide good heat resistance, superior dimensional stability and can be etching processed by an aqueous alkaline solution.Type: ApplicationFiled: February 9, 2004Publication date: June 15, 2006Applicant: MITSUI CHEMICALS, INC.Inventors: Koji Hirota, Naoki Nakazawa, Youichi Kodama
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Patent number: 7060846Abstract: Thienothiophene monomers having an SF5 group and conducting oligomers and polymers formed by the polymerization of such monomers and their use as hole injection materials, charge transport materials, or as semiconductors. The compound may be of the formula: where X and X? are independently H, halogen atoms (e.g., F, Cl, Br, and I), MgCl, MgBr, Mgl, Sn(R?)3, where R? comprises C1-6 alkyl or —OC1-6 alkyl, boronic acid, boronic ester, —CH?CHR? (where R? comprises H or C1-6 alkyl), —OC1-6 alkyl, —COOC1-6 alkyl, —S—COR?? and —COR?? (where R?? comprises H or C1-6 alkyl), —C?CH, or polymerizable aromatic rings (such as phenyl, naphthalene, pyrrole, dithiophene, thienothiophene, thiophene and so forth).Type: GrantFiled: September 20, 2005Date of Patent: June 13, 2006Assignee: Air Products and Chemicals, Inc.Inventors: Steffen Zahn, Andrew Francis Nordquist, Kristen Elaine Minnich, Guari Sankar Lal, William Franklin Burgoyne, Jr., Axel Klauck-Jacobs
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Publication number: 20060121812Abstract: A fiber mixture according to the invention comprises fibers A comprising a polymer A containing a thermoplastic polyurethane elastomer and fibers B comprising a thermoplastic polymer B other than the thermoplastic polyurethane elastomer, said thermoplastic polyurethane elastomer having a solidifying point of 65° C. or above as measured by a differential scanning calorimeter (DSC) and containing 3.00×106 or less polar-solvent-insoluble particles per g counted on a particle size distribution analyzer, which is based on an electrical sensing zone method, equipped with an aperture tube having an orifice of 100 ?m in diameter. An elastic nonwoven fabric comprises the fiber mixture.Type: ApplicationFiled: January 23, 2004Publication date: June 8, 2006Applicant: Mitsui Chemicals, Inc.Inventors: Kenichi Suzuki, Shigeyuki Motomura, Satoshi Yamasaki, Daisuke Nishiguchi, Hisashi Kawanabe
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Patent number: 7056641Abstract: A positive photosensitive resin composition of at least one uncapped polybenzoxazole precursor polymer, at least one capped polybenzoxazole precursor polymer, at least one photosensitive agent and at least one solvent, use of such compositions to pattern an image on a substrate and the resulting relied patterned substrates and electronic parts therefrom.Type: GrantFiled: July 8, 2005Date of Patent: June 6, 2006Assignee: Arch Specialty Chemicals, Inc.Inventors: Ahmad A. Naiini, William D. Weber, Pamela D. Waterson, Steve Lien-Chung Hsu
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Patent number: 7055263Abstract: A method for dry etching and chamber cleaning high dielectric constant materials is disclosed herein. In one aspect of the present invention, there is provided a process for cleaning a substance comprising a dielectric constant greater than the dielectric constant of silicon dioxide from at least a portion of a surface of a reactor comprising: introducing a first gas mixture comprising a boron-containing reactive agent into the reactor wherein the first gas mixture reacts with the substance contained therein to provide a volatile product and a boron-containing by-product; introducing a second gas mixture comprising a fluorine-containing reactive agent into the reactor wherein the second gas mixture reacts with the boron-containing by-product contained therein to form the volatile product; and removing the volatile product from the reactor.Type: GrantFiled: November 25, 2003Date of Patent: June 6, 2006Assignee: Air Products and Chemicals, Inc.Inventors: Dingjun Wu, Bing Ji, Stephen Andrew Motika, Eugene Joseph Karwacki, Jr.
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Publication number: 20060113355Abstract: The purpose of the present invention is provide a method of forming a flux layer on an aluminum plate member, wherein a heating step for drying after a spray-coating of a flux composition can be omitted. The invention relates to a flux layer 2 composed of solid constituents of 5-25 g/m2 formed on a surface of an aluminum plate member 1, by spray-coating a flux composition from a nozzle 20 to the plate member 1 with a thickness of 0.2-1.6 mm, which was press-molded and heated for degreasing in a heat-degreasing oven 10, while a temperature of the plate member 1 is kept from 120 to 180° C. under the remaining heat after completing a heating step for degreasing, and naturally drying for volatilizing volatile constituents of the flux composition utilizing the remaining heat.Type: ApplicationFiled: November 28, 2005Publication date: June 1, 2006Applicants: DENSO Corporation, Harima Chemicals, Inc.Inventors: Koji Onouchi, Shoei Teshima, Ichiro Taninaka
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Publication number: 20060116469Abstract: The paste composition of the present invention is a paste composition comprising (i) a polyurethane resin which comprises (a) a recurring unit represented by the formula (1) and (b) a recurring unit represented by the formula (2), a molar fraction of said recurring unit (a) being in the range of 0.35 to 0.99, a molar fraction of said recurring unit (b) being in the range of 0.01 to 0.65, the total of both the molar fractions being 1, (ii) a solvent and (iii) a powder. By the use of the paste composition, dielectric layers, sealing products, barrier ribs, phosphors, etc. can be favorably formed.Type: ApplicationFiled: October 27, 2004Publication date: June 1, 2006Applicant: Mitsui Takeda Chemicals, Inc.Inventors: Daiki Taneichi, Manabu Tsuruta, Masahiko Mitsuduka
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Publication number: 20060116303Abstract: A synthetic lubricating oil comprising an ?-olefin (co)polymer defined by the following features (i) to (v): (i) the (co)polymer contains constituent units derived from (a) at least one monomer selected from ?-olefins of 8 to 20 carbon atoms in amounts of 90 to 100% by mol and contains constituent units derived from (b) ethylene in amounts of 0 to 10% by mol, (ii) the dynamic viscosity at 100° C. is in the range of 8 to 500 mm2/s, (iii) the number-average molecular weight (Mn), as measured by gel permeation chromatography, is in the range of 500 to 15,000, (iv) the (co)polymer satisfies the following formulas (I) and (II): A?24.0×Exp (?0.0239×K) ??(I) B?0.0775×K ??(II) wherein A is a content (%) of a (co)polymer having a molecular weight, as measured by gel permeation chromatography, of not more than 1,000, B is a content (%) of a (co)polymer having a molecular weight of not less than 20,000, and K is a dynamic viscosity (mm2/s) at 100° C.Type: ApplicationFiled: November 25, 2005Publication date: June 1, 2006Applicant: MITSUI CHEMICALS, INC.Inventors: Yuriko Iimura, Hideki Hirano, Yasushi Tohi, Naomi Urakawa
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Publication number: 20060115741Abstract: A pellicle which can prevent the formation of foreign-matter deposits on a photo-mask during laser beam irradiation or storage and keep a high pattern accuracy for an extended period of time even when an exposure is made using a KrF or ArF excimer laser beam by removing deposit-causing materials from the pellicle itself in advance. During a pellicle producing process, a component member used or a completed product is heated or placed under pressure to thereby remove in advance substances produced from the component member used or the completed product.Type: ApplicationFiled: November 13, 2003Publication date: June 1, 2006Applicant: Mitsui Chemical, Inc.Inventors: Takashi Kozeki, Hiroaki Nakagawa
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Patent number: 7054764Abstract: A method for determining the flow rate of a fluid, having a liquid fraction and a gas fraction, having the steps of: measuring the pressure and temperature of the fluid at a flow control device through which said cyrogenic fluid passes; inputting the measured pressure and Cv into an algorithm; and performing a single or multi-step iteration to determine a fluid mass flow rate of the fluid through the flow control device using the algorithm that relates the mass flow rate of the fluid to the Cv, and mass densities of the liquid fraction and the gas fraction of the fluid which are a function of the measured pressure, and temperature. A system is also provided.Type: GrantFiled: September 13, 2004Date of Patent: May 30, 2006Assignee: Air Products and Chemicals, Inc.Inventors: Stuart Bruce Williams, Jean-Philippe Trembley, Jeremy Paul Miller
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Patent number: 7053159Abstract: A process for producing a polar olefin copolymer comprises copolymerizing a non-polar olefin and a polar olefin in the presence of a transition metal compound selected from Groups 4, 5, 6 and 11 of the periodic table, which is represented by the following formula (IV): wherein M? is a transition metal atom selected from Groups 4, 5, 6 and 11 of the periodic table, m is an integer of 1 to 6, A is —O—, —Si—, —Se—, —N(R6)—, n is a number satisfying a valence of M?, R1 to R4 and R6 are each a hydrogen atom, a halogen atom, a hydrocarbon group and the like, and X is a halogen atom, an oxygen atom, a hydrocarbon group and the like, and at least one compound (B) selected from the group consisting of an organometallic compound (B-1), an organoaluminum oxy-compound (B-2) and an ionic ionizing compound (B-3). Therefore, the process is capable of obtaining a polar olefin copolymer having excellent properties under mild polymerization conditions.Type: GrantFiled: July 3, 2001Date of Patent: May 30, 2006Assignee: Mitsui Chemicals, Inc.Inventors: Yoshihisa Inoue, Shigekazu Matsui, Yasuhiko Suzuki, Yasunori Yoshida, Yukihiro Takagi, Terunori Fujita, Tomoaki Matsugi, Takashi Nakano
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Patent number: 7052911Abstract: This invention provides novel methods for improving plant quality and yield in the presence of pathogens. The method increases the levels of pathogenesis-related proteins, such as PR1, phenylalanine ammonia lyase, or plant cell wall proteins such as hydroxyproline-rich glycoproteins, in a plant by contacting the plant with a plant systemic inducer and a reactive oxygen species wherein the amount of the reactive oxygen species is sufficient to increase the amount of the pathogenesis-related protein above the level induced by the plant systemic inducer in the absence of the reactive oxygen species. A preferred reactive oxygen species is peracetic acid; a preferred plant systemic inducer is salicylic acid.Type: GrantFiled: March 10, 2003Date of Patent: May 30, 2006Assignee: Redox Chemicals, Inc.Inventors: Darin J. Moon, Anne J. Anderson
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Publication number: 20060107873Abstract: In various embodiments, a pigment composition is provided comprising a base particle and a dispersing agent, the dispersing agent comprising a salt and/or ester of: (i) an amine, alcohol, and/or alkanol amine and (ii) a polyprotic acid, wherein the mole ratio of the amine, alcohol, and/or alkanol amine to the polyprotic acid is greater than 3:1. In various embodiments, the pigments have improved stability, hiding power, tint strength, and/or gloss.Type: ApplicationFiled: November 24, 2004Publication date: May 25, 2006Applicant: Millennium Inorganic Chemicals, Inc.Inventors: Modasser El-Shoubary, Robert Hopkins, Karen Bowen, David Bell
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Publication number: 20060110595Abstract: A film adhesive having an adhesive layer (C) mainly containing a thermoplastic polyimide having a glass transition temperature of not more than 100° C. and an adhesive layer (D) having a storage shear modulus of not more than 106 Pa at 50° C. Furthermore, the film adhesive further comprises a base material (A) and an adhesive layer (B). The film adhesive can exhibit excellent low-temperature adhesive property and covering capability functioning as a die bonding adhesive film which can be used in a semiconductor package. In addition, the film adhesive can exhibit excellent low-temperature adhesive property and covering capability which functions both as a die bonding adhesive film and as a dicing tape.Type: ApplicationFiled: November 14, 2005Publication date: May 25, 2006Applicant: MITSUI CHEMICALS, INC.Inventors: Youichi Kodama, Seiji Itami, Kuniaki Sato, Syuji Tahara
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Publication number: 20060110552Abstract: An ink jet recording medium which is excellent in ink absorptivity, color density, gloss, water resistance, light fastness and yellowing resistance, in particular, ink absorptivity, color density, light fastness and yellowing resistance. The ink jet recording medium comprises at least one ink receptive layer containing polymeric organic particles provided on a support, wherein the polymeric organic particles have a glass transition temperature (Tg) of 40° C. or higher and are amphoteric polymeric organic particles having both of the functional groups of a cationic group and an anionic group on the surface thereof.Type: ApplicationFiled: August 6, 2003Publication date: May 25, 2006Applicant: Mitsui Chemicals, Inc.Inventors: Tadashi Ishida, Yoshihiko Tomita, Masaya Kusumoto
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Patent number: 7049369Abstract: A styrene resin composition is provided which has a high molecular weight enabling a molded product obtained therefrom to have satisfactory strength, has a high melt mass-flow rate, high melt tension, and hence excellent moldability, and is less apt to gel during production, and a process for producing such a styrene resin composition. The styrene resin composition comprises a linear polystyrene having a weight average molecular weight of 200,000 to 350,000 and a multibranched polystyrene having a weight average molecular weight of 1,000,000 to 10,000,000, has an average molecular weight of 250,000 to 700,000, and a melt mass-flow rate (MFR) and melt tension (MT) which satisfy the following formulas (1) and (2) respectively: MFR?45×exp(?0.1×Mw×10?4)??(1) MT?0.07Mw×10?4+1.8.Type: GrantFiled: January 30, 2003Date of Patent: May 23, 2006Assignees: Dainippon Ink and Chemicals, Inc., Kawamura Institute of Chemical ResearchInventors: Hiroyuki Yamazaki, Tsuyoshi Morita, Ren-Hua Jin
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Patent number: RE39105Abstract: The invention provides near infrared absorbing materials showing high light-to-heat conversion efficiency and high sensitivity to lasers whose emission bands are within the range of 750 nm to 900 nm, original plates for direct printing plate making, and novel compounds which can be applied to such absorbing materials and plates. The compounds are polymethine compounds of the general formula (I) A detailed description of general formula (I) may be found in the specification. wherein R1 represents an alkoxy group which may be substituted; R2 represents an alkyl group which may be substituted; R3 and R4 each represents a lower alkyl group or R3 and R4 taken together represent a ring; X represents a hydrogen atom, a halogen atom or a substituted amino group; Y represents an alkoxy group which may be substituted or an alkyl group which may be substituted; Z represents a charge neutralizing ion.Type: GrantFiled: January 23, 2004Date of Patent: May 23, 2006Assignee: Yamamoto Chemicals, Inc.Inventors: Shigeo Fujita, Nobuaki Sasaki, Keiki Chichiishi, Yasuhisa Iwasaki