Abstract: Disclosed are a photosensitive polymer including a repeating unit of Chemical Formula 1 or Chemical Formula 2 derived from a vinyl heteroaromatic compound and a resist composition including the same. In Chemical Formula 1 or 2, R1 and R2 are hydrogen or a methyl group, X is a carbon, sulfur, or a nitrogen atom, and n is 1 or 2.

Abstract: An anti-reflective hard mask comprises: (a) a terpolymer in the form of a hetero aromatic represented by chemical formula 1, or a terpolymer blend comprising same; and (b) an organic solvent. wherein in the above Formula, X represents an oxygen, sulfur, or nitrogen atom, and n is 0 or 1, and Z group, as a monomer of the terpolymer, is a C6 to C40 aryl group and a heteroaryl group capable of forming a copolymer with the heteroaromatic monomer and a fluorenone derivative monomer, includes an ether bond or an amino bond, and R1 and R2 are hydrogen or a hydroxyl group, and are the same as or different from each other.

Abstract: An anti-reflective hard mask comprises: (a) a terpolymer in the form of a hetero aromatic represented by chemical formula 1, or a terpolymer blend comprising same; and (b) an organic solvent.