Abstract: A semiconductor package comprises a semiconductor chip having an active surface with a conductive pad thereon; an electroplated Au—Sn alloy bump over the active surface; and a (glass) substrate comprising conductive traces electrically coupling with the electroplated Au—Sn alloy bump, wherein the electroplated Au—Sn alloy bump has a composition from about Au0.35Sn0.15 to about Au0.75Sn0.25 in weight percent uniformly distributed from an end in proximity to the active surface to an end in proximity to the substrate. A method of manufacturing a semiconductor package comprises forming patterns of conductive pads on an active surface of a semiconductor chip; electroplating Au—Sn alloy bump over the conductive pads; and bonding the semiconductor chip on a corresponding conductive trace on a substrate by a reflow operation or a thermal press operation.

Abstract: A method of manufacturing a chip fan-out structure, said method includes forming a dry film with a predetermined pattern. Providing a chip wherein the distribution of the pad is corresponding to the dry film's predetermined pattern. Contacting the surface of the pad with the dry film. Forming a molding compound to encapsulate the chip, and removing the dry film to expose the pads.

Abstract: A thermally enhanced electronic package comprises a driver chip, an insulator, a flexible carrier, and carbon nanocapsules. The flexible carrier includes a flexible substrate, a wiring layer formed on the substrate, and a resistant overlaying the wiring layer. The driver chip is connected to the wiring layer. The insulator is filled in the gap between the driver chip and the flexible carrier. The carbon nanocapsules are disposed on the driver chip, on the resistant, on the flexible carrier, or in the insulator to enhance heat dissipation of electronic packages.

Abstract: A manufacturing method for a micro bump structure includes the following steps as follows. A substrate is provided and a under bump metallurgy (UBM) is formed on the substrate for accommodating a solder ball. A buffer layer is disposed on the substrate and then the solder ball is disposed on the UBM. Finally, the solder ball is grinded in order get the height reduced to a predetermined height.

Abstract: A conductive structure for a semiconductor chip and a method for forming the conductive structure are provided. The semiconductor chip comprises a semiconductor substrate, a pad, a passivation layer and a patterned insulating layer. The patterned insulating layer is disposed on the passivation layer and partially and directly covers the first opening of the pad to expose a second opening. The conductive structure comprises an under bump metal (UBM) layer and a conductive bump. The UBM layer is disposed in the second opening defined by the patterned insulating layer and is electrically connected to the pad. The conductive bump is disposed on the UBM layer and is electrically connected to the UBM layer. The upper surface of the conductive bump is greater than the upper surface of the patterned insulating layer, while the portion of the conductive bump disposed in the second opening is covered by the UBM layer.

Abstract: The present disclosure relates to a method for wafer level packaging and a package structure thereof. The method includes several steps. A through hole is formed in the interposer with a thickness that is less than the length of a first conducting pillar. The first conducting pillar is disposed inside the through hole. A redistribution layer is disposed and electrically connected with the first conducting pillar. A solder ball is disposed on the redistribution layer so as to form a wafer level packaging structure.

Abstract: A semiconductor structure includes a device, a conductive pad over the device and a Ag1-xYx alloy pillar disposed on the conductive pad, wherein the Y of the Ag1-xYx alloy comprises metals forming complete solid solution with Ag at arbitrary weight percentage, and wherein the X of the Ag1-xYx alloy is in a range of from about 0.005 to about 0.25.

Abstract: A fan-out package structure including a heat radiating side edge that includes a semiconductor substrate; a bond pad located on the semiconductor substrate; and a redistribution layer connected with the bond pad and located on the semiconductor substrate, wherein an end of the redistribution layer extends to a sidewall of the semiconductor substrate, and the end is coplanar with the sidewall.

Abstract: The present disclosure relates to a package structure of a lead frame. The package includes a die, a dielectric layer, at least one conducting pillar, at least one lead frame and at least one solder ball. The dielectric layer is disposed on a surface of the die. The at least one conducting pillar penetrates through the dielectric layer and is disposed on the surface. The at least one lead frame is disposed on the dielectric layer and is spaced from the at least one conducting pillar with a gap. The solder ball fills the gap and electrically connects the at least one conducting pillar and the at least one lead frame.

Abstract: The present disclosure relates to a method for wafer level packaging and a package structure thereof. The method includes several steps. A through hole is formed in the interposer with a thickness that is less than the length of a first conducting pillar. The first conducting pillar is disposed inside the through hole. A redistribution layer is disposed and electrically connected with the first conducting pillar. A solder ball is disposed on the redistribution layer so as to form a wafer level packaging structure.

Abstract: The present disclosure relates to a ball planting device for mounting a solder ball and a ball planting method thereof. The device includes a substrate, a dielectric layer, and a solder paste. The substrate includes a surface. The dielectric layer is disposed on the surface. The dielectric layer includes a plurality of apertures. The solder paste fills the apertures. A top surface of the solder paste is aligned with an exposed surface of the dielectric layer.

Abstract: A semiconductor structure includes a semiconductor substrate, a metal layer formed on the semiconductor substrate, a conductive pillar, and a solder ball. The conductive pillar is formed on and electrically connected with the metal layer, wherein the conductive pillar has a bearing surface and a horizontal sectional surface under the bearing surface, and the contact surface area of the bearing surface is larger than the area of the horizontal sectional surface. The solder ball is located on the conductive pillar and covers the bearing surface.

Abstract: The present invention provides a semiconductor package structure, which includes a die, a plurality of bonding wires, an encapsulant, and a plurality of first external terminals. The die has an active surface and a back surface. A first end of each of the bonding wires is connected to the back surface of the die, and a second end opposite to the first end is electrically connected to the active surface of the die. The encapsulant covers the back surface of the die and the bonding wires, wherein a portion of each of the bonding wires is exposed from the encapsulant. The first external terminals are disposed on the top surface of the encapsulant, and cover the exposed portions of the bonding wires respectively and are electrically connected to the bonding wires.

Abstract: A manufacturing method for a micro bump structure includes the following steps as follows. A substrate is provided and a under bump metallurgy (UBM) is formed on the substrate for accommodating a solder ball. A buffer layer is disposed on the substrate and then the solder ball is disposed on the UBM. Finally, the solder ball is grinded in order get the height reduced to a predetermined height.

Abstract: A method of manufacturing a chip fan-out structure, said method includes forming a dry film with a predetermined pattern. Providing a chip wherein the distribution of the pad is corresponding to the dry film's predetermined pattern. Contacting the surface of the pad with the dry film. Forming a molding compound to encapsulate the chip, and removing the dry film to expose the pads.

Abstract: The present disclosure is related to a method of providing a die structure for semiconductor packaging. The method includes providing a substrate with a bonding pad; forming a patterned mask layer on the substrate; forming an opening on the mask layer; depositing a conductive layer in the opening; forming a cap layer on the conductive layer, and removing the mask layer. The cap layer forming step allows the contacting area between the cap layer and the conductive layer to be substantially equal to the top surface area of the conductive layer by reflowing solder material prior to the removal of the mask layer.

Abstract: A conductive structure for a semiconductor chip and a method for forming the conductive structure are provided. The semiconductor chip comprises a plurality of first pads and second pads. The pad area is defined with a first area, a second area and a third area, wherein the first area is located between the second area and the third area. Each of the first pads and the second pads are interlaced to each other on the first area. The conductive structure comprises a plurality of conductive bumps formed on each of the first pads and the second pads respectively to electrically connect with each of the first pads and the second pads. Each of the conductive bumps has a first bump-width disposed on the first area and a second bump-width disposed on one of the second and third areas in which the first bump-width is shorter than the second bump-width.

Abstract: A structure of stacking chips and a method for manufacturing the structure of stacking chips are provided. A wafer with optical chips and a glass substrate with signal processing chips are stacked with each other, and then subjected to ball mounting and die sawing to form the stacked packaging structure. The optical chips and the signal processing chips form the electrical connection on the surface of the glass substrate via the through holes thereof.

Abstract: A method of manufacturing a semiconductor package structure is provided. A supporting plate and multiple padding patterns on an upper surface of the supporting plate define a containing cavity. Multiple leads electrically insulated from one another are formed on the padding patterns, extend from top surfaces of the padding patterns along side surfaces to the upper surface and are located inside the containing cavity. A chip is mounted inside the containing cavity, electrically connected to the leads. A molding compound is formed to encapsulate at least the chip, a portion of the leads and a portion of the supporting plate, fill the containing cavity and gaps among the padding patterns, and exposes a portion of the leads on the top surface. The supporting plate is removed to expose a back surface of each padding pattern, a bottom surface of the molding compound and a lower surface of each lead.

Abstract: A semiconductor structure is provided. The semiconductor structure includes a substrate, at least two pads, a passivation layer, at least two under bump metallization (UBM) layers and at least two bumps. The pads are disposed adjacent to each other on the substrate along the first direction. The passivation layer covers the substrate and the peripheral upper surface of each pad to define an opening. Each of the openings defines an opening projection along the second direction. The opening projections are disposed adjacent to each other but not overlapping with each other. Furthermore, the first direction is perpendicular to the second direction. The UBM layers are disposed on the corresponding openings, and the bumps are respectively disposed on the corresponding UBM layers. With the above arrangements, the width of each bump of the semiconductor structure of the present invention could be widened without being limited by the bump pitch.