Abstract: An ultraviolet (UV) absorbing compound and uses of the same are provided. The UV absorbing compound is represented by the following Formula I: in Formula I, each R is independently H, C1-C20 alkyl, glycidyl, or —(CH2CH2O)m—(CH2)p—CH3, wherein m is an integer of 1 to 20, p is an integer of 0 to 20, and n is an integer of 0 to 3.
Type:
Grant
Filed:
May 16, 2019
Date of Patent:
January 19, 2021
Assignee:
CHITEC TECHNOLOGY CO., LTD.
Inventors:
Chingfan Chris Chiu, Wei-Chun Chang, Huang-Min Wu, Yi-Shuo Huang
Abstract: A liquid photo initiating compound and uses of the same are provided. The compound is represented by the following Formula I: in Formula I, R1 and R2 are independently H or C1-C3 alkyl, and R3 is H or methyl.
Type:
Grant
Filed:
February 21, 2019
Date of Patent:
August 20, 2019
Assignee:
CHITEC TECHNOLOGY CO., LTD.
Inventors:
Wei-Chun Chang, Chingfan Chris Chiu, Huang-Min Wu
Abstract: The present invention relates to the antioxidant compounds which are synthesized or derived from benzofuranone compound and benzoic acid compound. The antioxidant compound with remarkable heat resistance possesses carbon-centered radical quencher and primary antioxidant synergism. It can be use as additive for polymer to enhance its stability of melting flow and color.
Type:
Grant
Filed:
August 24, 2011
Date of Patent:
September 23, 2014
Assignees:
Chitec Technology Co., Ltd., Double Bond Chemical Ind., Co., Ltd., FDC, Lees Chemical Industry Co. Ltd.
Abstract: The present invention relates to the antioxidant compounds which are synthesized or derived from benzofuranone compound and benzoic acid compound. The antioxidant compound with remarkable heat resistance possesses carbon-centered radical quencher and primary antioxidant synergism. It can be use as additive for polymer to enhance its stability of melting flow and color.
Type:
Application
Filed:
August 24, 2011
Publication date:
September 20, 2012
Applicants:
Chitec Technology Co., LTD., FDC, Lees Chemical Industry Co. LTD, Double Bond Chemical Ind., Ltd.