Patents Assigned to Chung-Shan Institute of Science and Technology, Armaments Bureau of National Defense
  • Germs resisting and self cleaning infiltration thin film and manufacturing method thereof
    Patent number: 8415408
    Abstract: The invention provides a germs resisting and self-cleaning infiltration thin film and manufacturing method thereof. At first, a Polyethyleneimine (PEI) and a Polyvinyl Alcohol (PVA) are used to make a polymer thin film. Then, a germ resistant and an inorganic metal oxide are added into the polymer thin film to form the selective infiltration thin film capable of resisting germs and self-cleaning.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: April 9, 2013
    Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau of National Defense
    Inventors: Cheng-Chien Yang, Kuo-Hui Wu, Wang-Tsai Gu, Yu-Zen Hsieh, Mang-Zhi Wu