Abstract: The present invention relates to a solution for treating a surface of a substrate for use in a semiconductor device. More particularly, the present invention relates to a liquid rinse formulation for use in semiconductor processing, wherein the liquid formulation contains: i. a surface passivation agent; and ii. an oxygen scavenger, wherein the pH of the rinse formulation is 8.0 or greater.
Type:
Application
Filed:
August 23, 2006
Publication date:
October 28, 2010
Applicant:
CITIBANK N.A. AS COLLATERAL AGENT
Inventors:
Janos Farkas, Maria-Luisa Calvo-Munez, Philippe Monnoyer, Sebastien Petitdidier