Abstract: Disclosed is a semiconductor light-emitting device wherein a pn junction is formed by forming, as a p-type layer (11), a semiconductor thin film which is composed of a ZnO compound doped with nitrogen on an n-type ZnO bulk single crystal substrate (10) whose resistance is lowered by being doped with donor impurities. It is preferable to form the p-type layer (11) on a zinc atom containing surface of the n-type ZnO bulk single crystal substrate (10).
Type:
Grant
Filed:
September 5, 2006
Date of Patent:
June 21, 2011
Assignees:
Citizen Tohoku Co., Ltd., Incorporated National University Iwate University
Abstract: Disclosed is a semiconductor light-emitting device wherein a pn junction is formed by forming, as a p-type layer (11), a semiconductor thin film which is composed of a ZnO compound doped with nitrogen on an n-type ZnO bulk single crystal substrate (10) whose resistance is lowered by being doped with donor impurities. It is preferable to form the p-type layer (11) on a zinc atom containing surface of the n-type ZnO bulk single crystal substrate (10).
Type:
Application
Filed:
September 5, 2006
Publication date:
October 29, 2009
Applicants:
CITIZEN TOHOKU CO., LTD., INCORPORATED NATIONAL UNIVERSITY IWATE UNIVERSITY