Abstract: A photoresist composition comprising a film forming resin obtained by condensing a phenol derivative and a substituted diphenyl ether, a photoactive compound, and a solvent. The photoresist composition may also contain an alkali-soluble, film-forming resin, such as a novolak resin. The photoresist of the instant invention improves the photospeed, resolution and thermal stability of the photoresist images.
Type:
Grant
Filed:
November 21, 1997
Date of Patent:
August 15, 2000
Assignee:
Clariant Finance Lmited
Inventors:
Stanley F. Wanat, Kathryn H. Jensen, Ping-Hung Lu, Douglas McKenzie