Patents Assigned to CLEAN CROP TECHNOLOGIES, INC.
  • Patent number: 12266510
    Abstract: A plasma treatment device is provided and includes a first electrode, a dielectric body supportive of the first electrode and a second mesh electrode having an opposite polarity as the first electrode and comprising a seating portion. The second mesh electrode is disposed proximate to the dielectric body to define a gap receptive of particles for collection in the seating portion. The gap is sized such that, with the second mesh electrode activated, a plasma field is generated to treat the particles in the seating portion. The seating portion is configured to retain the particles during treatment in opposition to ionic winds resulting from the plasma field.
    Type: Grant
    Filed: March 6, 2023
    Date of Patent: April 1, 2025
    Assignee: Clean Crop Technologies, Inc.
    Inventors: Yaqoot Shaharyar, Shardul Sreekumar, Michael DiFrancesco, Dominik Laszczkowski, Madhukar Prasad, Sandon Hess, Rachael Useted
  • Publication number: 20220386656
    Abstract: A system for treating food, the system including: a direct barrier discharge system including a pair of electrodes separated by a gap of at least 0.5 cm, wherein the direct barrier discharge system is configured to provide a feed gas between the electrodes, wherein the feed gas includes nitrogen and water, wherein a content of nitrogen in the feed gas is at least 75 vol % based on a total volume of the feed gas, and a relative humidity of the feed gas is at least 50% RH, wherein a content of oxygen in the feed gas is less than 1.5 vol % based on a total volume of the feed gas, and wherein the direct barrier discharge system is configured to provide an electric potential between the electrodes to generate a working gas having an ozone content of less than 20 ppm, based on a total volume of the working gas.
    Type: Application
    Filed: February 2, 2022
    Publication date: December 8, 2022
    Applicant: Clean Crop Technologies, Inc.
    Inventors: Daniel White, Yaqoot Shaharyar, Kevin Keener, Daniel Cavanaugh
  • Patent number: 11166481
    Abstract: Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.
    Type: Grant
    Filed: October 27, 2020
    Date of Patent: November 9, 2021
    Assignee: CLEAN CROP TECHNOLOGIES, INC.
    Inventors: Kevin M. Keener, Daniel White, Daniel Cavanaugh, Yaqoot Shaharyar