Abstract: Disclosed is a scrubber for processing semiconductor waste gas produced in a semiconductor fabricating process, wherein the scrubber burns the waste gas with a flame of a high temperature, filters and captures particles produced after the waste gas is burnt, and discharges particle-filtered waste gas to the atmosphere.
Type:
Grant
Filed:
September 1, 2006
Date of Patent:
July 20, 2010
Assignee:
Clean Systems Korea Inc.
Inventors:
Young Chan Lee, Hyung Geuk Kim, Sang Keun Lee