Patents Assigned to Clean Technology Co., Ltd.
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Patent number: 12576179Abstract: A virus removal device providing a high virus removal probability, a small pressure loss of a flowing gas, and miniaturization with respect to an amount of air to be treated, by adopting a wet mechanism for removing a virus from a gas, the virus removal device includes a cylindrical treatment room to introduce a gas and remove a virus, a catcher formed of a rotary brush, installed in the treatment room and configured to collect the virus contained in the gas, a liquid spraying mechanism in the treatment room, a rotary driving mechanism to rotate the catcher, a gas introducing portion to introduce the gas to the treatment room, a gas discharging portion to discharge the gas from which the virus has been removed from the treatment room, and a liquid discharging portion to discharge a liquid containing the virus that has been removed from the gas.Type: GrantFiled: October 11, 2021Date of Patent: March 17, 2026Assignee: CLEAN TECHNOLOGY CO., LTD.Inventor: Toshio Awaji
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Patent number: 12023622Abstract: A dust-containing gas treatment apparatus includes a cylindrical treatment room configured to introduce gas containing dust and remove the dust from the gas, a catcher including a brush with hair planted in a support in the cylindrical treatment room and configured to catch the dust contained in the gas, a liquid sprayer in the cylindrical treatment room, a rotary driver configured to rotate the catcher and a stirrer, a gas introduction portion configured to introduce the gas containing the dust, a gas discharge portion configured to discharge the gas and the removed dust from the cylindrical treatment room, and a liquid discharge portion configured to discharge a liquid containing the removed dust.Type: GrantFiled: March 24, 2023Date of Patent: July 2, 2024Assignee: CLEAN TECHNOLOGY CO., LTD.Inventor: Toshio Awaji
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Patent number: 11633689Abstract: In order to provide a dust-containing gas treatment apparatus which can smoothly achieve the treatment of gas containing dust of high concentration, the apparatus is equipped with a cylindrical treatment room to introduce gas containing dust and remove the dust from the gas, catcher consisting of brush with the hair planted in the support installed in the treatment room to catch the dust contained in the gas, liquid spraying mechanism installed in the treatment room, rotary driving mechanism to rotate the catcher and stirrer, gas introducing portion to introduce the gas containing dust, gas discharging portion to discharge the gas, the dust removed, from the treatment room and liquid discharging portion to discharge the liquid containing the dust removed from the gas.Type: GrantFiled: November 20, 2018Date of Patent: April 25, 2023Assignee: CLEAN TECHNOLOGY CO., LTD.Inventor: Toshio Awaji
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Patent number: 9675930Abstract: A plasma control method for an exhaust gas treating apparatus includes providing an exhaust gas treating apparatus having a plasma discharge space, a coil disposed on an outer circumference of the plasma discharge space, an upper electrode, and a lower electrode; generating plasma in the plasma discharge space; controlling the state of the plasma generated in the plasma discharge space by generating a magnetic field in the plasma discharge space between the upper electrode and the lower electrode; and cooling the reaction tube using a water cooled jacket disposed around the reaction tube. The magnetic field is generated by applying a current to the coil.Type: GrantFiled: April 1, 2010Date of Patent: June 13, 2017Assignee: CLEAN TECHNOLOGY CO., LTD.Inventors: Toshio Awaji, Takashi Nakayama, Toshio Tanaka
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Patent number: 8877134Abstract: The present invention, aiming at providing an exhaust gas treating system capable of increasing the exhaust gas treating volume, through increase of the diameter of the reaction tube, stabilizing the state of generation of plasma without requiring any water membrane, and improving the harmful matters removing performance by extending the plasma length, comprises a reaction tube 1 for introducing exhaust gas G, an upper electrode 2 disposed in the air on the top side of the reaction tube 1, a lower electrode 3 disposed on the bottom side of the reaction tube 1, and a spray nozzle 4 for spraying an electrolytic solution D between the upper electrode 2 and the lower electrode 3, so as to form a path of electric current between the electrodes 2, 3 and generate plasma P in the reaction tube 1, by spraying an electrolytic solution D between the upper electrode 2 and the lower electrode 3.Type: GrantFiled: February 5, 2008Date of Patent: November 4, 2014Assignee: Clean Technology Co., Ltd.Inventors: Toshio Awaji, Takashi Nakayama