Abstract: A glassware polishing system includes a base and a wall extending upward from the base. The wall circumscribes and defines a chamber within an inner side of the wall. A first polishing head having a first spindle extends upward from the base within the chamber and has a polishing material disposed about the first spindle. A second polishing head having a second spindle extends upward from the base within the chamber and has a polishing material disposed about the second spindle. At least one motor is disposed in the base and is configured to rotate the polishing heads about vertical axes of rotation defined by the spindles. The polishing heads may simultaneously polish internal and external surfaces of the glassware when the first polishing heads are rotated by the at least one motor.