Patents Assigned to CMTech Co., Ltd.
  • Patent number: 10617779
    Abstract: The invention relates to a vacuum exhaust system of a sterilizer, comprising: a sterilization chamber; a first vacuum pump connected to one side of the sterilization chamber; an oil mist trap section for exhausting steam incoming from the sterilization chamber via the first vacuum pump; and a second vacuum pump connected to the first vacuum pump and the oil mist trap section. The vacuum exhaust system of a sterilizer according to the invention comprises the second vacuum pump connected to the first vacuum pump and the oil mist trap section, wherein by turning the second vacuum pump on to apply a vacuum to the operating oil in the first vacuum pump, thereby providing a certain pressure for evaporating water in liquid state to the first vacuum pump, the invention can vaporize the water vapor trapped in the operating oil in the first vacuum pump.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: April 14, 2020
    Assignee: CMTECH CO. LTD.
    Inventors: Heung Sik Min, Young Keun Ahn, Sung Jin Yang, Jin Woo Min
  • Patent number: 10448663
    Abstract: The present invention relates to a coffee roaster having a housing, a supporting plate located within the housing, a drum chamber located at one side of the supporting plate within the housing, a first support for supporting the drum chamber, and a second support for supporting the drum chamber. The supporting plate may include a heater. The first support may be adjacent to the outer circumferential surface of the drum chamber. The second support may be adjacent to the outer circumferential surface of the drum chamber and be spaced apart from the first support by a predetermined distance. As the drum chamber rotates by receiving a driving force for rotation from the first supporting unit, the drum chamber can be rotated without being obstructed by the heater.
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: October 22, 2019
    Assignee: CMTECH CO., LTD.
    Inventors: Heung Sik Min, Young Keun Ahn, Sung Jin Yang, Jin Woo Min
  • Patent number: 10369241
    Abstract: Provided are a sterilization apparatus including a sterilization chamber, a vacuum pump connected to one side of the sterilization chamber, a vaporizer connected to another side of the sterilization chamber, and a collector having one side connected to the vaporizer and the other side connected to the sterilization chamber and a sterilization method using the sterilization apparatus. In the sterilization apparatus and the sterilization method, a hydrogen peroxide solution having a concentration of 95 wt % or higher may be obtained through multiple concentration steps and used as a sterilant, thereby considerably improving a sterilization effect.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: August 6, 2019
    Assignee: CMTECH CO., LTD.
    Inventors: Heung Sik Min, Young Keun Ahn, Sung Jin Yang, Jong Wook Kim
  • Patent number: 10232073
    Abstract: The present invention relates to a vacuum exhaust system of a sterilizer, comprising: a sterilization chamber; a first vacuum pump connected to one side of the sterilization chamber; an oil mist trap section for exhausting steam incoming from the sterilization chamber via the first vacuum pump; and a second vacuum pump connected to the first vacuum pump and the oil mist trap section. The vacuum exhaust system of a sterilizer according to the present invention comprises the second vacuum pump connected to the first vacuum pump and the oil mist trap section, wherein by turning the second vacuum pump on to apply a vacuum to the operating oil in the first vacuum pump, thereby providing a certain pressure for evaporating water in liquid state to the first vacuum pump, the present invention can vaporize the water vapor trapped in the operating oil in the first vacuum pump.
    Type: Grant
    Filed: June 23, 2015
    Date of Patent: March 19, 2019
    Assignee: CMTECH CO., LTD.
    Inventors: Heung Sik Min, Young Keun Ahn, Sung Jin Yang, Jin Woo Min
  • Publication number: 20170014539
    Abstract: The present invention relates to a vacuum exhaust system of a sterilizer, comprising: a sterilization chamber; a first vacuum pump connected to one side of the sterilization chamber; an oil mist trap section for exhausting steam incoming from the sterilization chamber via the first vacuum pump; and a second vacuum pump connected to the first vacuum pump and the oil mist trap section. The vacuum exhaust system of a sterilizer according to the present invention comprises the second vacuum pump connected to the first vacuum pump and the oil mist trap section, wherein by turning the second vacuum pump on to apply a vacuum to the operating oil in the first vacuum pump, thereby providing a certain pressure for evaporating water in liquid state to the first vacuum pump, the present invention can vaporize the water vapor trapped in the operating oil in the first vacuum pump.
    Type: Application
    Filed: June 23, 2015
    Publication date: January 19, 2017
    Applicant: CMTECH CO., LTD.
    Inventors: Heung Sik MIN, Young Keun AHN, Sung Jin YANG, Jin Woo MIN
  • Patent number: 9115912
    Abstract: The present invention relates to a fluid heating device which can instantaneously heat a fluid which is flowing for the purpose of supply or circulation. It comprises: a ceramic heater in the form of a flat plate having terminal lead wires for applying a power source; partition plates, to top and bottom of the ceramic heater, which allow the fluid which is to be heated to move towards the ceramic heater and which said partition plates have horizontal-movement fluid pathways such that fluid which has been heated by means of the ceramic heater is discharged; a flow path forming plate having a fluid through path such that the fluid on the horizontal-movement fluid pathways can move vertically to the fluid pathway of the next layer; an upper cover having an inlet hole for the supply of a fluid for heating the outside surface of the uppermost partition plate; and a final lower cover having an outlet hole for discharging the heated fluid onto the outside surface of the lowermost partition plate.
    Type: Grant
    Filed: January 20, 2009
    Date of Patent: August 25, 2015
    Assignee: CMTECH CO., LTD.
    Inventors: Hung Sik Min, Young Geun An, Sung Jin Yang
  • Patent number: 8128884
    Abstract: A plasma reactor has high durability with performance to generate stable and uniform plasma. The reactor has a variety of advantages such as increasing the range of commercial applications since the reactor has a structure that allows simple and efficient installation and operation in a system at a position required by the system. The reactor includes a stack constructed by sequentially stacking plus and minus electrodes and spacers and a reactor body provided at one side of the stack to hold the stack. The plus and minus electrodes are arranged alternately with spacers to define passages through which gas is allowed to pass. Each of the plus and minus electrodes has deformation preventing means to disperse stress of the electrodes and to prevent a local thermal stress caused by thermal expansion and contraction, thereby increasing thermal shock-resistant performance. External terminals for connection to the plus and minus electrodes are provided on the reactor body.
    Type: Grant
    Filed: August 10, 2007
    Date of Patent: March 6, 2012
    Assignee: CMTech Co., Ltd.
    Inventors: Hung Sik Min, Young Geun An, Sung Jin Yang