Abstract: The present invention relates to a retainer ring structure for a CMP apparatus and a method for manufacturing the same. The retainer ring structure may include screws for fixing the retainer ring structure mounted on a polishing head during a CMP process, the screw being made of a high-strength metallic material, and the method for manufacturing the retainer ring structure may be simplified. Thus, a coupling force with the polishing head may be increased to reduce a defect rate, and the process may be simplified to reduce an operation time and a manufacturing cost, thereby increasing merchantability.

Abstract: A retainer ring structure for a chemical-mechanical polishing (CMP) machine includes: an insert ring made of metal and having a plurality of holes formed at the top surface thereof and coupled to a head of the CMP machine; an insert pin made of resin, including a body having a hollow portion of which the top surface is opened and one or more elongated grooves formed at side surfaces thereof in a longitudinal direction, and press-fitted into a hole of the insert ring so as to be subjected to a tapping process; and an outer ring formed to surround the insert pin and the insert ring.

Abstract: A retainer ring structure for a chemical-mechanical polishing (CMP) machine includes: a upper ring made of metal and having a plurality of bolt holes formed on the top surface thereof and coupled to a head of the CMP machine; and a lower ring made of resin and having a coupling groove formed in the center thereof and coupled to the upper ring, wherein the upper ring and the lower ring are coupled to each other such that the top surface of the upper ring and the circumferential top surface of the lower ring are positioned on the same plane.